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534633

Sigma-Aldrich

PSS-(1-丙基异丁烯酸)-七异丁基取代

别名:

3-(3,5,7,9,11,13,15-七异丁基五环[9.5.13,9.15,15.17,13]八硅氧烷-1-基)丙基甲基丙烯酸酯

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About This Item

经验公式（希尔记法）:
C35H74O14Si8
CAS号:
307531-94-8
分子量:
943.64
MDL號碼:
MFCD02683452
分類程式碼代碼:
12162002
PubChem物質ID:
329757946
NACRES:
NA.23

mp

108-112 °C (lit.)

品質等級

100

SMILES 字串

CC(C)C[Si]12O[Si]3(CCCOC(=O)C(C)=C)O[Si]4(CC(C)C)O[Si](CC(C)C)(O1)O[Si]5(CC(C)C)O[Si](CC(C)C)(O2)O[Si](CC(C)C)(O3)O[Si](CC(C)C)(O4)O5

InChI

1S/C35H74O14Si8/c1-27(2)20-51-38-50(19-17-18-37-35(36)34(15)16)39-52(21-28(3)4)43-54(41-51,23-30(7)8)47-57(26-33(13)14)48-55(42-51,24-31(9)10)44-53(40-50,22-29(5)6)46-56(45-52,49-57)25-32(11)12/h27-33H,15,17-26H2,1-14,16H3

InChI 密鑰

CVYLJMBNVJQTGW-UHFFFAOYSA-N

相关类别

一般說明

PSS-(1-Propylmethacrylate)-Heptaisobutyl substituted silsesquioxane (POSS) is a polyhedral oligomeric silsesquioxane (POSS) with an inorganic-organic cage-like architecture made up of silicon and oxygen.

應用

PSS-(1-Propylmethacrylate)-Heptaisobutyl substituted can be used as a functional monomer to prepare molecularly imprinted polymers or hybrid monolithic materials (MIPs) via reversible addition-fragmentation chain transfer polymerization (RAFT) or thermally initiated free radical polymerization reactions using suitable template molecules, cross-linker, porogenic solvent, and initiator. The resulting polymeric materials exhibited excellent polymer properties such as high thermal stability, high mechanical stability, low inflammability surface hardening, and oxidation resistance. These POSS nanostructural polymeric materials are commonly used in various biomedical applications, drug delivery, imaging reagents, catalyst supports, enzyme-like catalysis, solid-phase extraction, sensors, and in the chromatographic stationary phase.

儲存類別代碼

11 - Combustible Solids

水污染物質分類（WGK）

WGK 3

個人防護裝備

Eyeshields, Gloves, type N95 (US)

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分析证书(COA)

Lot/Batch Number
MKCL1276
MKBW2808V
MKBT3779V
MKBN3809V
MKBG3189V

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八乙烯基-POSS

Sigma-Aldrich

475424

八乙烯基-POSS

Qing-Li Zhao et al.
Talanta, 152, 277-282 (2016-03-20)
Polyhedral oligomeric silsesquioxane (POSS) was successfully applied, for the first time, to prepare imprinted monolithic coating for capillary electrochromatography. The imprinted monolithic coating was synthesized with a mixture of PSS-(1-Propylmethacrylate)-heptaisobutyl substituted (MA 0702), S-amlodipine (template), methacrylic acid (functional monomer), and
Shu-Ping Gao et al.
Analytical and bioanalytical chemistry, 409(15), 3741-3748 (2017-03-28)
Polyhedral oligomeric silsesquioxane (POSS) was utilized to prepare imprinted polymer through reversible addition-fragmentation chain transfer polymerization (RAFT) successfully. The imprinted polymer was made with a mixture of RAFT agent, 4-vinylpyridine (4-VP), POSS monomer [PSS-(1-propylmethacrylate)-heptaisobutyl substituted, MA 0702], and ethylene glycol
Junjie Ou et al.
Analytica chimica acta, 761, 209-216 (2013-01-15)
A simple approach to fabricate hybrid monolithic column within the confines of fused-silica capillaries (75 μm i.d.) was introduced. A polyhedral oligomeric silsesquioxanes (POSS) reagent containing a methacrylate group was selected as functional monomer, and copolymerized with bisphenol A dimethacrylate

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