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Merck

257222

Sigma-Aldrich

三甲基铝

97%

别名:

TMA, 三甲基铝

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About This Item

线性分子式:
(CH3)3Al
CAS号:
分子量:
72.09
Beilstein:
3587197
EC號碼:
MDL號碼:
分類程式碼代碼:
12352103
PubChem物質ID:
NACRES:
NA.23

蒸汽壓力

69.3 mmHg ( 60 °C)

描述

heat of vaporization: ~41.9 kJ/mol (dimer)

化驗

97%

形狀

liquid

反應適用性

core: aluminum

bp

125-126 °C (lit.)
127 °C/760 mmHg
20 °C/8 mmHg
56 °C/50 mmHg

mp

15 °C (lit.)

密度

0.752 g/mL at 25 °C (lit.)

SMILES 字串

C[Al](C)C

InChI

1S/3CH3.Al/h3*1H3;

InChI 密鑰

JLTRXTDYQLMHGR-UHFFFAOYSA-N

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一般說明

Trimethylaluminum (TMA) is a widely used precursor in the chemical vapor deposition (CVD) process to produce thin films in various applications. TMA is highly reactive and pyrophoric, which makes it an effective source of aluminum in thin film deposition processes to improve optoelectronic properties, such as enhanced light absorption and carrier transport characteristics.

應用

Trimethylaluminum can be used:
  • As a growth initiator to synthesize self-assembled aluminum nanoparticles via atomic layer deposition.
  • As a precursor to synthesize aluminum-doped ZnO thin films(AZO) for electron transport layer of perovskite solar cells. TMA enhances electrical conductivity and thermal stability of perovskite layers.
  • To fabricate Al2O3-coated Si-alloy anodes for Li-ion batteries. This coating helps to suppress the volume expansion of Si and improves cell stability.
  • To fabricate Al2O3-coated graphite electrode with superior anti-self-discharging behavior (260 h) with long stability (900 cycles), for Al-ion battery.

包裝

以配备1/4转向青铜球阀(Z122661)的Sure/Pac气瓶供货。配备1/4"" NPT出口内螺纹,并以1/4"" NPT外螺纹碳钢塞密封。确认阀门处于关闭位置后必须在使用前取下塞子。

适配:详情参见技术手册AL-136:Aldrich Sure/Pac 气缸系统

其他說明

低于20°C条件下储存可能会导致结晶的形成。

法律資訊

Aldrich is a registered trademark of Sigma-Aldrich Co. LLC
Sure/Pac is a trademark of Sigma-Aldrich Co. LLC

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价格

隔膜進氣口介面卡

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象形圖

FlameCorrosion

訊號詞

Danger

危險聲明

危險分類

Eye Dam. 1 - Pyr. Liq. 1 - Skin Corr. 1B - Water-react 1

安全危害

儲存類別代碼

4.2 - Pyrophoric and self-heating hazardous materials

水污染物質分類(WGK)

nwg

閃點(°F)

No data available

閃點(°C)

No data available

個人防護裝備

Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter


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Photo-induced current and its degradation in Al4C3/Al2O3 (0001) grown by metalorganic chemical vapor deposition
Kim D, et al.
Thin Solid Films, 557, 216-221 (2014)
Metalorganic chemical vapor deposition of Al2O3 using trimethylaluminum and O2 precursors: Growth mechanism and crystallinity
Liu X, et al.
Journal of Crystal Growth, 408, 78-84 (2014)
Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion
Oili ME, et al.
Thin Solid Films, 552, 124-135 (2014)
G R V de Sousa et al.
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