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About This Item
经验公式（希尔记法）:
HfO2
CAS号:
分子量:
210.49
EC號碼:
MDL號碼:
分類程式碼代碼:
12352303
PubChem物質ID:
NACRES:
NA.23
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品質等級
化驗
98%
形狀
powder
密度
9.68 g/mL at 25 °C (lit.)
SMILES 字串
O=[Hf]=O
InChI
1S/Hf.2O
InChI 密鑰
CJNBYAVZURUTKZ-UHFFFAOYSA-N
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應用
- Hafnium(IV) oxide: Utilized predominantly in the semiconductor industry, Hafnium(IV) oxide offers excellent thermal and chemical stability, which makes it suitable as a high-k gate dielectric material in metal-oxide-semiconductor (MOS) devices. Its application has become increasingly important with the miniaturization of electronic components, aiding in the enhancement of transistor performance without further reducing the component size. This role is critical in the development of more efficient, faster computing technologies (Sigma-Aldrich, CAS 12055-23-1).
儲存類別代碼
11 - Combustible Solids
水污染物質分類（WGK）
nwg
閃點（°F）
Not applicable
閃點（°C）
Not applicable
個人防護裝備
Eyeshields, Gloves, type N95 (US)
商品
In recent years silicon carbide, SiC, has re-emerged as a vital technological material that is crucial in many materials and engineering applications.
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