Skip to Content
Merck
All Photos(1)

Documents

759562

Sigma-Aldrich

Tris(dimethylamino)silane

packaged for use in deposition systems

Synonym(s):

Tris(dimethylamino)silane, (Me2N)3SiH, N,N,N′,N′,N′′, N′′-Hexamethylsilanetriamine, Tris(dimethylamido)silane, N,N,N′,N′,N′′,N′′-Hexamethylsilanetriamine, TDMAS

Sign Into View Organizational & Contract Pricing
All Photos(1)

About This Item

Linear Formula:
((CH3)2N)3SiH
CAS Number:
15112-89-7
Molecular Weight:
161.32
EC Number:
239-165-0
MDL number:
MFCD00048006
UNSPSC Code:
12352103
PubChem Substance ID:
329766793
NACRES:
NA.23

Assay

≥99.9% (GC)

form

liquid

bp

142 °C (lit.)

mp

−90 °C (lit.)

density

0.838 g/mL at 25 °C (lit.)

SMILES string

CN(C)[SiH](N(C)C)N(C)C

InChI

1S/C6H19N3Si/c1-7(2)10(8(3)4)9(5)6/h10H,1-6H3

InChI key

TWVSWDVJBJKDAA-UHFFFAOYSA-N

Looking for similar products? Visit Product Comparison Guide

General description

Tris(dimethylamino)silane is an organosilicon compound with high volatility and thermal stability, widely used as a vapor deposition precursor to fabricate silicon-containing thin films for various applications, including solar cells, fuel cell catalysts, and semiconductors. The depositions can be carried out at low substrate temperatures (<150). The melting point and vapor pressure of TDMAS is in a suitable working range, thus making it a very good vapor deposition precursor.

Application

Tris(dimethylamino)silane can be used:
  • As a silicon source for deposition of aluminum silicate on TiO2 anodes for dye-sensitized solar cells vis atomic layer deposition method.
  • As a precursor to fabricate functionalized Si reinforced separators for Li-ion batteries.

Signal Word

Danger

Hazard Classifications

Acute Tox. 3 Dermal - Acute Tox. 3 Inhalation - Acute Tox. 4 Oral - Eye Dam. 1 - Flam. Liq. 2 - Skin Corr. 1B - Water-react 2

Supplementary Hazards

EUH029

Storage Class Code

4.3 - Hazardous materials which set free flammable gases upon contact with water

WGK

WGK 3

Flash Point(F)

16.0 - 32.0 °F - closed cup

Flash Point(C)

-8.89 - 0.00 °C - closed cup

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

Already Own This Product?

Find documentation for the products that you have recently purchased in the Document Library.

Visit the Document Library

Boudreau; M.; Boumerzoug; M.; Mascher; P.; Jessop; P. E.
Applied Physics Letters, 63, 3014-3014 (1993)
Hirose; F.; Kinoshita; Y.; Shibuya; S.; et al
Thin Solid Films, 519, 270-270 (2011)
B Ballantyne et al.
Toxicology and industrial health, 5(1), 45-54 (1989-01-01)
The acute handling hazards of tris(dimethylamino)silane [TDMAS] were investigated. The acute male rat peroral LD50 (with 95% confidence limits) was 0.71 (0.51-0.97) ml/kg, and the acute male rabbit percutaneous LD50 was 0.57 (0.35-0.92) ml/kg. The liquid was severely irritating to

Articles

Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition

Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition

Recent Progress in Spintronic Materials

Spin-based electronic (spintronic) devices offer significant improvement to the limits of conventional charge-based memory and logic devices which suffer from high power usage, leakage current, performance saturation, and device complexity.

Nanowire Synthesis: From Top-Down to Bottom-Up

The properties of many devices are limited by the intrinsic properties of the materials that compose them.

Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.

Contact Technical Service