759562

Tris(dimethylamino)silane

packaged for use in deposition systems

• Synonym(s): Tris(dimethylamino)silane, (Me₂N)₃SiH, N,N,N′,N′,N′′, N′′-Hexamethylsilanetriamine, Tris(dimethylamido)silane, N,N,N′,N′,N′′,N′′-Hexamethylsilanetriamine, TDMAS
• Linear Formula: ((CH₃)₂N)₃SiH
• CAS Number: 15112-89-7
• Molecular Weight: 161.32
• EC Number: 239-165-0
• MDL number: MFCD00048006
• UNSPSC Code: 12352300
• PubChem Substance ID: 329766793
• NACRES: NA.23

Properties

• Quality Level: 100
• Assay: ≥99.9% (GC)
• form: liquid
• bp: 142 °C (lit.)
• mp: −90 °C (lit.)
• density: 0.838 g/mL at 25 °C (lit.)
• SMILES string: CN(C)[SiH](N(C)C)N(C)C
• InChI: 1S/C6H19N3Si/c1-7(2)10(8(3)4)9(5)6/h10H,1-6H3
• InChI key: TWVSWDVJBJKDAA-UHFFFAOYSA-N

Description

Application

Tris(dimethylamino)silane (TDMAS) is used as an organosilicon source for the deposition of Si oxynitride; carbonitride; nitride and oxide thin films. It is also used to form multicomponent silicon containing thin films. The depositions can be carried out at low substrate temperatures (<150). The melting point and vapor pressure of TDMAS is in a suitable working range; thus making it a very good vapor deposition precursor.

Safety Information

• Pictograms: GHS02,GHS05,GHS06
• Signal Word: Danger
• Hazard Statements: H225 - H261 - H302 - H311 - H314 - H330
• Precautionary Statements: P210 - P231 + P232 - P280 - P303 + P361 + P353 - P304 + P340 + P310 - P305 + P351 + P338
• Hazard Classifications: Acute Tox. 1 Inhalation - Acute Tox. 3 Dermal - Acute Tox. 4 Oral - Eye Dam. 1 - Flam. Liq. 2 - Skin Corr. 1B - Water-react 2
• Supplementary Hazards: EUH029
• Storage Class Code: 4.3 - Hazardous materials, which set free flammable gases upon contact with water
• WGK: WGK 3
• Flash Point(F): 16.0 - 32.0 °F - closed cup
• Flash Point(C): -8.89 - 0,00 °C - closed cup