8.18888

Xenon difluoride

for synthesis

• 동의어(들): Xenon difluoride
• 실험식(Hill 표기법): F₂Xe
• CAS Number: 13709-36-9
• Molecular Weight: 169.29
• MDL number: MFCD00040538
• UNSPSC 코드: 12352307
• EC 인덱스 번호: 237-251-2
• NACRES: NA.22

속성

• vapor pressure: 3.8 hPa ( 25 °C)
• Quality Level: 200
• 양식: crystals
• mp: 130-135 °C (sublimed)
• 저장 온도: 2-8°C
• InChI: 1S/F2Xe/c1-3-2
• InChI key: IGELFKKMDLGCJO-UHFFFAOYSA-N

설명

애플리케이션

• Organic Laboratory Applications: Discusses how xenon difluoride interacts with organic substrates, highlighting its reaction mechanisms and versatility in organic synthesis (Ramsden, 2014).


• Aromatic Compounds Fluorination: Investigates the fluorination of aromatic compounds using xenon difluoride, emphasizing its advantages over elemental fluorine for safer and more controlled reactions (Fedorov et al., 2015).


• Microfabrication: Describes the use of xenon difluoride for dry etching in microfabrication, particularly for creating microelectromechanical systems by etching sacrificial silicon layers (Rowlands, 2015).


• Excitation Studies: Explores the excitation of Europium(III) in the presence of xenon difluoride, showing how xenon difluoride can assist in producing electronically excited states (Masyagutova et al., 2024).


• Etching of Sacrificial Layers: Details the application of xenon difluoride in the etching of sacrificial layers for the fabrication of microelectromechanical devices, demonstrating its effectiveness in creating complex structures (Vahanissi, 2019).

분석 메모

Assay (iodometric): ≥ 98.0 %

안전성 정보

• 픽토그램: GHS03,GHS05,GHS06
• 신호어: Danger
• 유해 및 위험 성명서: H272 - H301 - H314 - H330
• 예방조치 성명서: P210 - P260 - P280 - P303 + P361 + P353 - P304 + P340 + P310 - P305 + P351 + P338
• Hazard Classifications: Acute Tox. 1 Inhalation - Acute Tox. 3 Oral - Eye Dam. 1 - Ox. Sol. 2 - Skin Corr. 1B
• Storage Class Code: 5.1B - Oxidizing hazardous materials
• WGK: WGK 3
• Flash Point (°F): Not applicable
• Flash Point (°C): Not applicable