추천 제품
mp
133-137 °C (lit.)
Quality Level
λmax
233 nm
SMILES string
[O-]S(=O)(=O)C(F)(F)F.c1ccc(cc1)[S+](c2ccccc2)c3ccccc3
InChI
1S/C18H15S.CHF3O3S/c1-4-10-16(11-5-1)19(17-12-6-2-7-13-17)18-14-8-3-9-15-18;2-1(3,4)8(5,6)7/h1-15H;(H,5,6,7)/q+1;/p-1
InChI key
FAYMLNNRGCYLSR-UHFFFAOYSA-M
일반 설명
Triphenylsulfonium triflate (TPS-tf) is a photo-acid generator which can be incorporated in conjugated polymers to enhance the luminescence and reduce the operating voltage. The performance efficiency of the fabricated device is increased by improving the mobility of charge carriers.
애플리케이션
TPS-tfs can be used as photoacid generators for the preparation of a bilayer system based nanoporous template which can be potentially used in sensor applications. It can also be used to form a blend with polyfluorene-co-benzothiadiazole for the fabrication of organic light emitting diodes (OLEDs).
신호어
Warning
유해 및 위험 성명서
Hazard Classifications
Eye Irrit. 2 - Skin Irrit. 2 - STOT SE 3
표적 기관
Respiratory system
Storage Class Code
11 - Combustible Solids
WGK
WGK 3
Flash Point (°F)
Not applicable
Flash Point (°C)
Not applicable
개인 보호 장비
dust mask type N95 (US), Eyeshields, Gloves
이미 열람한 고객
Incorporating triphenyl sulfonium salts in polyfluorene PLEDs: an all-organic approach to improved charge injection.
Georgiadou DG, et al.
Journal of Materials Chemistry, 21(25), 9296-9301 (2011)
Novel ArF excimer laser resists based on menthyl methacrylate terpolymer.
Shida N, et al.
J. Photopolym. Sci. Technol., 9(3), 457-464 (1996)
Fabrication of block copolymer templates by using dually responsive photoresist bottom layers.
Jung K, et al.
Reactive and Functional Polymers, 118(31), 20-25 (2017)
Effect of triphenylsulfonium triflate addition in wide band-gap polymer light-emitting diodes: improved charge injection, transport and electroplex-induced emission tuning.
Georgiadou DG, et al.
Royal Society of Chemistry Advances, 2(31), 11786-11792 (2012)
N M Doll et al.
Science (New York, N.Y.), 367(6476), 431-435 (2020-01-25)
The plant embryonic cuticle is a hydrophobic barrier deposited de novo by the embryo during seed development. At germination, it protects the seedling from water loss and is, thus, critical for survival. Embryonic cuticle formation is controlled by a signaling
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