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274402

Sigma-Aldrich

Tetramethyltetraselenafulvalene

97%

Synonym(s):

TMTSF

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About This Item

Empirical Formula (Hill Notation):
C10H12Se4
CAS Number:
Molecular Weight:
448.04
Beilstein:
1619644
MDL number:
UNSPSC Code:
12352100
PubChem Substance ID:
NACRES:
NA.22

Assay

97%

form

solid

mp

273-275 °C (dec.) (lit.)

SMILES string

CC1=C(C)[Se]\C([Se]1)=C2\[Se]C(C)=C(C)[Se]2

InChI

1S/C10H12Se4/c1-5-6(2)12-9(11-5)10-13-7(3)8(4)14-10/h1-4H3

InChI key

YMWLPMGFZYFLRP-UHFFFAOYSA-N

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General description

Tetramethyltetraselenafulvalene salts and charge-transfer complexes exhibit superconducting properties.

Application

Tetramethyltetraselenafulvalene was used in the preparation of charge-transfer salt nanowires using the galvanostatic deposition technique.

Signal Word

Danger

Hazard Statements

Hazard Classifications

Acute Tox. 3 Inhalation - Acute Tox. 3 Oral - Aquatic Acute 1 - Aquatic Chronic 1 - STOT RE 2

Storage Class Code

6.1C - Combustible acute toxic Cat.3 / toxic compounds or compounds which causing chronic effects

WGK

WGK 3

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Regulatory Listings

Regulatory Listings are mainly provided for chemical products. Only limited information can be provided here for non-chemical products. No entry means none of the components are listed. It is the user’s obligation to ensure the safe and legal use of the product.

PDSCL

Poisonous substance

PRTR

Class I Designated Chemical Substances

ISHL Indicated Name

Substances Subject to be Indicated Names

ISHL Notified Names

Substances Subject to be Notified Names

JAN Code

274402-10MG:4548173128719
274402-VAR:
274402-BULK:
274402-50MG:4548173128726


Certificates of Analysis (COA)

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Front. Solid State Sci., 1, 81-81 (1993)
Youn Jung Jung et al.
Journal of nanoscience and nanotechnology, 12(7), 5397-5401 (2012-09-13)
TMTSF-based (TMTSF = tetramethyltetraselenafulvalene = C10H12Se4) charge-transfer salt nanowires were fabricated using the galvanostatic deposition technique that was assisted by an anodic aluminum oxide (AAO) template. By applying a low current density of 1-2 microA/cm2 for more than one month

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