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Safety Information

274208

Sigma-Aldrich

Dichlorodiethylsilane

97%

Synonym(s):

Diethyldichlorosilane, Diethyldichlorosilicon

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About This Item

Linear Formula:
(C2H5)2SiCl2
CAS Number:
1719-53-5
Molecular Weight:
157.11
Beilstein:
605313
EC Number:
217-005-0
MDL number:
MFCD00000493
UNSPSC Code:
12352001
PubChem Substance ID:
24856572
NACRES:
NA.22

Assay

97%

form

liquid

refractive index

n20/D 1.43 (lit.)

bp

125-131 °C (lit.)

density

1.05 g/mL at 25 °C (lit.)

storage temp.

2-8°C

SMILES string

CC[Si](Cl)(Cl)CC

InChI

1S/C4H10Cl2Si/c1-3-7(5,6)4-2/h3-4H2,1-2H3

InChI key

BYLOHCRAPOSXLY-UHFFFAOYSA-N

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Signal Word

Danger

Hazard Statements

H226,H302,H314,H335

Hazard Classifications

Acute Tox. 4 Oral - Eye Dam. 1 - Flam. Liq. 3 - Skin Corr. 1B - STOT SE 3

Target Organs

Respiratory system

Supplementary Hazards

EUH014

Storage Class Code

3 - Flammable liquids

WGK

WGK 1

Flash Point(F)

79.0 °F

Flash Point(C)

26.1 °C

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Regulatory Listings

Regulatory Listings are mainly provided for chemical products. Only limited information can be provided here for non-chemical products. No entry means none of the components are listed. It is the user’s obligation to ensure the safe and legal use of the product.

FSL

Group 4: Flammable liquids
Type 2 petroleums
Hazardous rank III
Water insoluble liquid

JAN Code

274208-25G:
274208-100G:
274208-5G:
274208-VAR:
274208-BULK:

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Certificates of Analysis (COA)

Lot/Batch Number
MKCQ3829
SHBJ6395
SHBD3497V
SHBB1443V
28496CK

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Peter Bieling et al.
The EMBO journal, 37(1), 102-121 (2017-11-17)
WASP-family proteins are known to promote assembly of branched actin networks by stimulating the filament-nucleating activity of the Arp2/3 complex. Here, we show that WASP-family proteins also function as polymerases that accelerate elongation of uncapped actin filaments. When clustered on
David Gräfe et al.
Nature communications, 9(1), 2788-2788 (2018-07-19)
Existing photoresists for 3D laser lithography that can be removed after development in a subtractive manner typically suffer from harsh cleavage conditions. Here, we report chemoselectively cleavable photoresists for 3D laser lithography based on silane crosslinkers, allowing the targeted degradation

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