Skip to Content
Merck
All Photos(1)

Key Documents

More Documents

Safety Information

38385

Sigma-Aldrich

Dichlorodiisopropylsilane

≥97.0% (GC)

Synonym(s):

Diisopropyldichlorosilane

Sign Into View Organizational & Contract Pricing
All Photos(1)

About This Item

Empirical Formula (Hill Notation):
C6H14Cl2Si
CAS Number:
7751-38-4
Molecular Weight:
185.17
Beilstein:
1736244
MDL number:
MFCD00054895
UNSPSC Code:
12352001
PubChem Substance ID:
329755681
NACRES:
NA.22

Quality Level

100

Assay

≥97.0% (GC)

form

liquid

refractive index

n20/D 1.444

bp

66 °C/27 mmHg (lit.)

density

1.026 g/mL at 20 °C (lit.)

SMILES string

CC(C)[Si](Cl)(Cl)C(C)C

InChI

1S/C6H14Cl2Si/c1-5(2)9(7,8)6(3)4/h5-6H,1-4H3

InChI key

GSENNYNYEKCQGA-UHFFFAOYSA-N

Related Categories

Other Notes

Protecting group reagent; brings two alcohols in close contact for "tethering technique"

Pictograms

FlameCorrosion
GHS02,GHS05

Signal Word

Danger

Hazard Statements

H226 - H314

Hazard Classifications

Flam. Liq. 3 - Skin Corr. 1B

Storage Class Code

3 - Flammable liquids

WGK

WGK 3

Flash Point(F)

109.4 °F - closed cup

Flash Point(C)

43 °C - closed cup

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Regulatory Listings

Regulatory Listings are mainly provided for chemical products. Only limited information can be provided here for non-chemical products. No entry means none of the components are listed. It is the user’s obligation to ensure the safe and legal use of the product.

FSL

Flammable liquids
Type 2 petroleums
Hazardous rank III
Water insoluble liquid

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

Already Own This Product?

Find documentation for the products that you have recently purchased in the Document Library.

Visit the Document Library

J.H. Hutchinson et al.
Tetrahedron Letters, 32, 573-573 (1991)
C.L. Bradford et al.
Tetrahedron Letters, 36, 4189-4189 (1995)
David Gräfe et al.
Nature communications, 9(1), 2788-2788 (2018-07-19)
Existing photoresists for 3D laser lithography that can be removed after development in a subtractive manner typically suffer from harsh cleavage conditions. Here, we report chemoselectively cleavable photoresists for 3D laser lithography based on silane crosslinkers, allowing the targeted degradation

Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.

Contact Technical Service