472352
Poly(4-vinylpyridine)
average Mw ~160,000
Sinonimo/i:
4-Vinylpyridine polymer, Poly(p -vinylpyridine)
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About This Item
Prodotti consigliati
PM
average Mw ~160,000
Livello qualitativo
Temp. transizione
Tg 142 °C (onset, annealed)
Solubilità
DMF, acetic acid and lower alcohols: soluble
InChI
1S/C7H7N/c1-2-7-3-5-8-6-4-7/h2-6H,1H2
KFDVPJUYSDEJTH-UHFFFAOYSA-N
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Categorie correlate
Applicazioni
Poly(4-vinylpyridine) can be used:
- To prepare metal-containing polymer, applicable as nonlinear optically active material.
- For the removal of perchlorate from an aqueous solution.
Codice della classe di stoccaggio
11 - Combustible Solids
Classe di pericolosità dell'acqua (WGK)
WGK 3
Punto d’infiammabilità (°F)
Not applicable
Punto d’infiammabilità (°C)
Not applicable
Dispositivi di protezione individuale
dust mask type N95 (US), Eyeshields, Gloves
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Journal of chromatography. A, 1256, 15-21 (2012-08-14)
A simple and facile needle-adapter was designed for constructing manual on-line polymer monolith microextraction-high performance liquid chromatography (PMME-HPLC). A capillary poly(4-vinylpyridine-co-ethylene glycol dimethacrylate) [poly(VP-co-EGDMA)] monolith was prepared by in situ polymerization, using 4-vinylpyridine (VP) and ethylene glycol dimethacrylate (EGDMA) as
Biomimetic surface coatings for atmospheric water capture prepared by dewetting of polymer films.
Advanced materials (Deerfield Beach, Fla.), 23(32), 3718-3722 (2011-07-19)
Ultrasonics sonochemistry, 20(1), 26-31 (2012-08-28)
Poly(4-vinylpyridinium) perchlorate, is a supported, recyclable, eco-benign catalyst for synthesis of substituted coumarins via Pechmann reaction using ultrasound irradiation at room temperature and neat condition in high yields with short reaction times. The catalyst was studied by FT-IR, X-ray diffraction
ACS applied materials & interfaces, 3(8), 3042-3048 (2011-07-07)
Atom transfer radical polymerization (ATRP) is commonly used to grow polymer brushes from Au surfaces, but the resulting film thicknesses are usually significantly less than with ATRP from SiO(2) substrates. On Au, growth of poly(methyl methacrylate) (PMMA) blocks from poly(tert-butyl
Advanced materials (Deerfield Beach, Fla.), 24(48), 6445-6450 (2012-09-27)
A simple, efficient, and scalable method for patterning microstructures on curved substrates is demonstrated. Initiated chemical vapor deposition is used to synthesize a thin film that crosslinks upon UV exposure. Polymeric features are defined on glass rods with high curvature
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