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Merck
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419354

Sigma-Aldrich

对甲苯三氯硅烷

95%

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About This Item

线性分子式:
CH3C6H4SiCl3
CAS号:
701-35-9
分子量:
225.57
EC號碼:
211-854-0
MDL號碼:
MFCD00045131
分類程式碼代碼:
12352002
PubChem物質ID:
24866104
NACRES:
NA.22

品質等級

100

化驗

95%

形狀

liquid

折射率

n20/D 1.5240 (lit.)

bp

218-220 °C (lit.)

密度

1.273 g/mL at 25 °C (lit.)

SMILES 字串

Cc1ccc(cc1)[Si](Cl)(Cl)Cl

InChI

1S/C7H7Cl3Si/c1-6-2-4-7(5-3-6)11(8,9)10/h2-5H,1H3

InChI 密鑰

WOMUGKOOLXQCTQ-UHFFFAOYSA-N

相关类别

應用

Self-assembled monolayers (SAMs) of p-tolyltrichlorosilane (TTCS) were formed on flexible polymer substrates. p-Tolyltrichlorosilane copolymerized with methylphenyldichlorosilane was grafted on silicon to introduce a structural defect.

象形圖

Corrosion
GHS05

訊號詞

Danger

危險聲明

H314

危險分類

Eye Dam. 1 - Skin Corr. 1B

安全危害

EUH014

儲存類別代碼

8A - Combustible corrosive hazardous materials

水污染物質分類（WGK）

WGK 3

閃點（°F）

210.2 °F - closed cup

閃點（°C）

99 °C - closed cup

個人防護裝備

Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter

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分析证书(COA)

Lot/Batch Number
MKBX7571V
05712DE
10829CD
02714CD
05903BD

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Fabrication of self-assembled monolayers (SAMs) and inorganic micropattern on flexible polymer substrate.
Langmuir, 20(8), 3278-3283 (2004)
Effects of structural defects on hole drift mobility in aryl-substituted polysilanes.
Philosophical Magazine Part B, 79(10), 1631-1645 (1999)
Ignazio Blanco et al.
Molecules (Basel, Switzerland), 25(13) (2020-07-02)
Novel polystyrene (PS)/polyhedral oligomeric silsequioxanes (POSSs) nanocomposites were designed and prepared by in situ polymerization, using, for the first time, three-cage POSS molecules. The synthesized compounds were first characterized by Fourier transform infrared spectroscopy (FTIR) and 1H NMR spectroscopy to

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