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218170

Sigma-Aldrich

乙炔基三甲基硅烷

98%

别名:

三甲基硅乙炔

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About This Item

线性分子式:
(CH3)3SiC≡CH
CAS号:
1066-54-2
分子量:
98.22
Beilstein:
906752
MDL號碼:
MFCD00008569
分類程式碼代碼:
12352100
PubChem物質ID:
24853048
NACRES:
NA.22

蒸汽壓力

4.18 psi ( 20 °C)

品質等級

200

化驗

98%

形狀

liquid

折射率

n20/D 1.388 (lit.)

bp

53 °C (lit.)

密度

0.709 g/cm3 (lit.)

儲存溫度

2-8°C

SMILES 字串

C[Si](C)(C)C#C

InChI

1S/C5H10Si/c1-5-6(2,3)4/h1H,2-4H3

InChI 密鑰

CWMFRHBXRUITQE-UHFFFAOYSA-N

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相关类别

一般說明

激光诱导气态乙炔三甲基硅烷基聚合反应被用来进行聚碳硅烷薄膜化学蒸发沉淀。乙炔三甲基硅烷基是镍催化苯腈类交联反应底物。

應用

乙炔三甲基硅烷基用于：
  • 微波辅助一锅法三步Sonogashira交联-脱硅环加成反应，制备1,4-取代1,2，3-三唑
  • 合成含有Pd（II）配位点的聚（乙炔三甲基硅烷基）
  • 通过1,3-两极重氮化合物乙酰基环加成合成吡唑

象形圖

FlameExclamation mark
GHS02,GHS07

訊號詞

Danger

危險聲明

H225,H315,H319

危險分類

Eye Irrit. 2 - Flam. Liq. 2 - Skin Irrit. 2

儲存類別代碼

3 - Flammable liquids

水污染物質分類（WGK）

WGK 1

閃點（°F）

-29.2 °F

閃點（°C）

-34 °C

個人防護裝備

Faceshields, Gloves, Goggles

历史批次信息供参考:

分析证书(COA)

Lot/Batch Number
BCCG5767
BCCF6462
BCCD5098
0000099578
BCCD1110

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Atmospheric pressure chemical vapour deposition of polycarbosilane films via UV laser-induced polymerization of ethynyltrimethylsilane.
Pola J, et al.
Surface and Coating Tech., 149(2), 129-134 (2002)
Tetrahedron Letters, 45, 4989-4992 (2004)
Frédéric Friscourt et al.
Organic letters, 12(21), 4936-4939 (2010-10-15)
A microwave-assisted, one-pot, three-step Sonogashira cross-coupling-desilylation-cycloaddition sequence was developed for the convenient preparation of 1,4-disubstituted 1,2,3-triazoles starting from a range of halides, acyl chlorides, ethynyltrimethylsilane, and azides.
Francisco J Caparrós et al.
Molecules (Basel, Switzerland), 25(4) (2020-02-26)
A new 2,7,10,15-tetraethynyldibenzo[g,p]chrysene ligand (1) and two tetranuclear gold(I) derivatives containing PPh3 (3) and PMe3 (4) phosphines were synthesized and characterized by 1H and 31P NMR, IR spectroscopy, and high-resolution mass spectrometry. The compounds were studied in order to analyze
Heterocycles, 68, 1961-1961 (2006)
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Reagents for C–C Bond Formation

We carry a large variety of electrophiles and nucleophiles that are widely used in C–C bond-forming reactions. This group of products contains many organometallic reagents as well as commonly-used alkylating and acylating reagents.

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