900815

SLAP 5-TMS TM

≥95%

• Sinónimos: 2-((Bis(trimethylsilyl)methyl)thio)ethanamine
• Fórmula empírica (notación de Hill): C₉H₂₅NSSi₂
• Número de CAS: 2084112-39-8
• Peso molecular: 235.54
• Código UNSPSC: 12352200
• NACRES: NA.22

Propiedades

• Ensayo: ≥95%
• Formulario: suspension
• densidad: 0.9126
• temp. de almacenamiento: 2-8°C
• cadena SMILES: NCCSC([Si](C)(C)C)[Si](C)(C)C

Descripción

Aplicación

When used with aliphatic or aromatic aldehydes, this silicon amine protocol SLAP reagent enables the photomediated synthesis of thiomorpholines and thiazepanes. For photocatalytic cross-coupling with this SLAP Reagent, Ir[(ppy)₂dtbbpy]PF₆ (747769) is used with a recommended starting combination of Lewis acids Bi(OTf)₃ (633305) and Cu(OTf)₂ (283673) prior to subsequent substrate-specific optimization. This product was introduced in collaboration with the Bode Research Group and provides a tin-free alternative to SnAP (tin amine protocol) reagents and is well-suited for scale-up reactions.

Otras notas

• Technology Spotlight: SLAP Reagents for Piperazine Synthesis
• Silicon Amine Reagents for the Photocatalytic Synthesis of Piperazines from Aldehydes and Ketones
• Lewis Acid Induced Toggle from Ir(II) to Ir(IV) Pathways in Photocatalytic Reactions: Synthesis of Thiomorpholines and Thiazepanes from Aldehydes and SLAP Reagents.
• Continuous Flow Synthesis of Morpholines and Oxazepanes with Silicon Amine Protocol (SLAP) Reagents and Lewis Acid Facilitated Photoredox Catalysis

Información de seguridad

• Pictogramas: GHS02
• Palabra de señalización: Danger
• Frases de peligro: H225
• Consejos de prudencia: P210 - P370 + P378 - P403 + P235
• Clasificaciones de peligro: Flam. Liq. 2
• Código de clase de almacenamiento: 3 - Flammable liquids
• Clase de riesgo para el agua (WGK): WGK 3
• Punto de inflamabilidad (°F): 30.0 °F
• Punto de inflamabilidad (°C): -1.11 °C