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651796

Sigma-Aldrich

Negativ-Photoresist I

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About This Item

CAS-Nummer:
9003-31-0
MDL-Nummer:
MFCD00084438
UNSPSC-Code:
41116107
NACRES:
NA.23

Mol-Gew.

average Mw 60,000-70,000 (polyisoprene)

Qualitätsniveau

100

Zusammensetzung

solids, 27-29 wt. %

Dielektrizitätskonstante

2.4

Oberflächenspannung

29.2 dyn/cm

Viskosität

465-535 cP(25 °C)

bp

122-142 °C (lit.)

Dichte

0.89 g/mL at 25 °C (lit.)

λmax

310-480 nm

Lagertemp.

2-8°C

InChI

1S/C14H28O2/c1-4-5-6-7-8-9-10-13-15-11-14(2,3)12-16-13/h13H,4-12H2,1-3H3

InChIKey

UBZVSDZJBLSIJG-UHFFFAOYSA-N

Verwandte Kategorien

Allgemeine Beschreibung

A stabilized, purified photoresist which exhibits superior resolution, adhesion, etch resistance and low pinhole density.
Available as part of Negative Photoresist kit 654892

Signalwort

Danger

Gefahreneinstufungen

Acute Tox. 4 Dermal - Acute Tox. 4 Inhalation - Aquatic Chronic 3 - Asp. Tox. 1 - Eye Irrit. 2 - Flam. Liq. 3 - Repr. 1B - Skin Irrit. 2 - STOT SE 3

Zielorgane

Respiratory system

Lagerklassenschlüssel

3 - Flammable liquids

WGK

WGK 3

Flammpunkt (°F)

75.2 °F - closed cup

Flammpunkt (°C)

24 °C - closed cup

Persönliche Schutzausrüstung

Eyeshields, Faceshields, Gloves, type ABEK (EN14387) respirator filter

Hier finden Sie alle aktuellen Versionen:

Analysenzertifikate (COA)

Lot/Batch Number
MKCK5970
MKCJ2028
MKCG8986
MKCJ0922
MKCF2182

Die passende Version wird nicht angezeigt?

Wenn Sie eine bestimmte Version benötigen, können Sie anhand der Lot- oder Chargennummer nach einem spezifischen Zertifikat suchen.

Suche nach COA

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In der Dokumentenbibliothek finden Sie die Dokumentation zu den Produkten, die Sie kürzlich erworben haben.

Die Dokumentenbibliothek aufrufen

S M Al-Salem et al.
Journal of hazardous materials, 172(2-3), 1690-1694 (2009-08-29)
Thermo-chemical treatments (mainly pyrolysis) directed towards energy and products recovery provide a very promising alternative to open space disposal or landfilling, reducing in the process hazardous waste and potential contamination to soil and water resources. In this communication, we present
Stéphane Dubascoux et al.
Journal of chromatography. A, 1224, 27-34 (2012-01-17)
This paper presents results from the first analyses of the mesostructure of natural rubber (NR) by asymmetrical flow field flow fractionation (AF4). The results are compared with those obtained by size exclusion chromatography (SEC) in terms of average molar masses
S Wołoszczuk et al.
The European physical journal. E, Soft matter, 33(4), 343-350 (2010-12-02)
We simulate ABA triblock copolymer melts using a lattice Monte Carlo method, known as cooperative motion algorithm, probing various degrees of compositional asymmetry. Selected order-disorder transition lines are determined in terms of the segment incompatibility, quantified by product χN
Shunsuke Imai et al.
Enzyme and microbial technology, 49(6-7), 526-531 (2011-12-07)
Rubber-degrading bacteria were screened for the production of clearing zones around their colonies on latex overlay agar plates. Novel three bacteria, Streptomyces sp. strain LCIC4, Actinoplanes sp. strain OR16, and Methylibium sp. strain NS21, were isolated. To the best of
N Hambsch et al.
Journal of applied microbiology, 109(3), 1067-1075 (2010-04-23)
Natural rubber (poly-[cis-1,4-isoprene]) can be cleaved into 12-oxo-4,8-dimethyltrideca-4,8-diene-1-al by rubber oxygenase A (RoxA) isolated from Xanthomonas sp. RoxA is a novel type of dihaem dioxygenase with unknown cleavage mechanism of the rubber carbon backbone. Analysis of mutant RoxA after mutagenesis
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Protokolle

Negative Photoresist Procedure

Our photoresist kit was designed to have the necessary chemical components for each step in the lithographic process. The component materials are provided in pre-weighed quantities for your convenience. Etchants are available separately so that the proper etchant can be chosen for a variety of substrate choices.

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