900400

SLAP 3-SpiroCyHex N-Bn Pip Reagent

≥95%

• Sinonimo/i: 1-((Benzyl((trimethylsilyl)methyl)amino)methyl)cyclohexanamine
• Formula empirica (notazione di Hill): C₁₈H₃₂N₂Si
• Peso molecolare: 304.55
• Codice UNSPSC: 12352103
• ID PubChem: 329769828
• NACRES: NA.22

Proprietà

• Saggio: ≥95%
• Stato: liquid
• Indice di rifrazione: n/D 1.516
• Densità: 0.956 g/mL
• Gruppo funzionale: amine; phenyl
• Temperatura di conservazione: −20°C
• InChI: 1S/C18H32N2Si/c1-21(2,3)16-20(14-17-10-6-4-7-11-17)15-18(19)12-8-5-9-13-18/h4,6-7,10-11H,5,8-9,12-16,19H2,1-3H3; HHDPYUUHZQUCNL-UHFFFAOYSA-N

Descrizione

Applicazioni

Silicon amine protocol (SLAP) reagents, in conjunction with aldehydes and ketones, form N-unprotected piperazines via photocatalytic cross-coupling with Ir[(ppy)₂dtbbpy]PF₆ (747769). Heteroaromatic, aromatic, and aliphatic aldehydes are well tolerated, as are structurally and stereochemically complex SLAP reagents. This product was introduced in collaboration with the Bode Research Group and provides a tin-free alternative to SnAP (tin amine protocol) reagents for piperazine synthesis.

Altre note

• Technology Spotlight: SLAP Reagents for Piperazine Synthesis
• Silicon Amine Reagents for the Photocatalytic Synthesis of Piperazines from Aldehydes and Ketones
• Lewis Acid Induced Toggle from Ir(II) to Ir(IV) Pathways in Photocatalytic Reactions: Synthesis of Thiomorpholines and Thiazepanes from Aldehydes and SLAP Reagents.
• Continuous Flow Synthesis of Morpholines and Oxazepanes with Silicon Amine Protocol (SLAP) Reagents and Lewis Acid Facilitated Photoredox Catalysis

Informazioni sulla sicurezza

• Pittogrammi: GHS07
• Avvertenze: Warning
• Indicazioni di pericolo: H315,H319,H335
• Consigli di prudenza: P261 - P264 - P271 - P280 - P302 + P352 - P305 + P351 + P338
• Classi di pericolo: Eye Irrit. 2 - Skin Irrit. 2 - STOT SE 3
• Organi bersaglio: Respiratory system
• Codice della classe di stoccaggio: 10 - Combustible liquids
• Classe di pericolosità dell'acqua (WGK): WGK 3