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749052

Sigma-Aldrich

Chromium

sputtering target, diam. × thickness 3.00 in. × 0.125 in., 99.95% trace metals basis

Sinonimo/i:

Chromium element

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About This Item

Formula empirica (notazione di Hill):
Cr
Numero CAS:
Peso molecolare:
52.00
Numero CE:
Numero MDL:
Codice UNSPSC:
12352103
ID PubChem:
NACRES:
NA.23

Saggio

99.95% trace metals basis

Forma fisica

solid

Impiego in reazioni chimiche

core: chromium

Resistività

12.7 μΩ-cm, 20°C

diam. × spessore

3.00 in. × 0.125 in.

P. eboll.

2672 °C (lit.)

Punto di fusione

1857 °C (lit.)

Densità

7.14 g/mL at 25 °C (lit.)

Stringa SMILE

[Cr]

InChI

1S/Cr
VYZAMTAEIAYCRO-UHFFFAOYSA-N

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Applicazioni

Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. It is commonly used for thin-film deposition, etching and analytical techniques.

Codice della classe di stoccaggio

11 - Combustible Solids

Classe di pericolosità dell'acqua (WGK)

nwg

Punto d’infiammabilità (°F)

Not applicable

Punto d’infiammabilità (°C)

Not applicable


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J A J Vanoirbeek et al.
Journal of toxicology and environmental health. Part A, 66(4), 393-409 (2003-01-30)
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B Seifert et al.
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In conventional photostimulable storage phosphors, the optical information written by x-ray or ultraviolet irradiation is usually read out as a visible photostimulated luminescence (PSL) signal under the stimulation of a low-energy light with appropriate wavelength. Unlike the transient PSL, here
A J Hart et al.
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