408964

Methacrylsäure-cyclohexylester

≥97%, contains ~60 ppm monomethyl ether hydroquinone as inhibitor

• Synonym(e): Cyclohexyl-methacrylat
• Lineare Formel: CH₂=C(CH₃)COOC₆H₁₁
• CAS-Nummer: 101-43-9
• Molekulargewicht: 168.23
• Beilstein: 2045235
• EG-Nummer: 202-943-5
• MDL-Nummer: MFCD00014292
• UNSPSC-Code: 12162002
• PubChem Substanz-ID: 24865610
• NACRES: NA.23

Eigenschaften

• Assay: ≥97%
• Form: liquid
• Enthält: ~60 ppm monomethyl ether hydroquinone as inhibitor
• Brechungsindex: n20/D 1.458 (lit.)
• bp: 68-70 °C/4 mmHg (lit.)
• Dichte: 0.964 g/mL at 25 °C (lit.)
• SMILES String: CC(=C)C(=O)OC1CCCCC1
• InChI: 1S/C10H16O2/c1-8(2)10(11)12-9-6-4-3-5-7-9/h9H,1,3-7H2,2H3
• InChIKey: OIWOHHBRDFKZNC-UHFFFAOYSA-N

Beschreibung

Allgemeine Beschreibung

Cyclohexyl methacrylate(CHMA) is an acrylate monomer with a high-refractive index, commonly used in ultraviolet (UV) curing processes due to its ability to rapidly polymerize under UV light exposure. UV-curable CHMA-based coatings, adhesives, and inks offer fast curing, excellent hardness, hydrophobicity, and high durability. It has good optical clarity, resulting in optical lenses with high transparency and minimal distortion. It can also be used as a crosslinking agent in copolymer systems for dental composites and tissue engineering to enhance the mechanical and thermal properties of the resulting materials.

Anwendung

Cyclohexyl methacrylate can be used:

• As a monomer to prepare poly(cyclohexyl methacrylate) (PCHMA) thin films for high-performance luminescent solar concentrators(LSCs). These LSCs can be used to fabricate high-quantum yield photovoltaic solar cells.
• As a comonomer to prepare photo-patternable quantum dot-acrylate resins for fabricating light-emitting diodes with high color transparency.
• As a monomer to synthesizesuperhydrophobic silica nanoparticle surfaces for various applications such as anti-corrosionsurfaces, drag reduction, and energy conservation.

Sicherheitshinweise

• Piktogramme: GHS07
• Signalwort: Warning
• H-Sätze: H315,H317,H319,H335
• P-Sätze: P261 - P264 - P271 - P280 - P302 + P352 - P305 + P351 + P338
• Gefahreneinstufungen: Eye Irrit. 2 - Skin Irrit. 2 - Skin Sens. 1 - STOT SE 3
• Zielorgane: Respiratory system
• Lagerklassenschlüssel: 10 - Combustible liquids
• WGK: WGK 1
• Flammpunkt (°F): 181.4 °F
• Flammpunkt (°C): 83 °C
• Persönliche Schutzausrüstung: Eyeshields, Gloves, type ABEK (EN14387) respirator filter