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Titanium(IV) oxide, nanopowder, 21 nm primary particle size (TEM), ≥99.5% trace metals basis
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Titanium(IV) oxide, anatase, nanopowder, <25 nm particle size, 99.7% trace metals basis
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Titanium(IV) oxide, puriss., meets analytical specification of Ph. Eur., BP, USP, 99-100.5%
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Titanium(IV) oxide, anatase, powder, 99.8% trace metals basis
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Titanium(IV) oxide, mixture of rutile and anatase, nanopowder, <100 nm particle size (BET), 99.5% trace metals basis
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Titanium(IV) oxide, rutile, powder, <5 μm, ≥99.9% trace metals basis
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Titanium(IV) oxide, anatase, powder, −325 mesh, ≥99% trace metals basis
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Titanium(IV) oxide, rutile, nanopowder, <100 nm particle size, 99.5% trace metals basis
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Titanium, powder, <45 μm avg. part. size, 99.98% trace metals basis
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Titanium, foil, thickness 0.127 mm, 99.7% trace metals basis
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Titanium, foil, thickness 0.25 mm, 99.7% trace metals basis
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Titanium(IV) oxide, mixture of rutile and anatase, nanoparticles, <150 nm particle size (volume distribution, DLS), dispersion, 40 wt. % in H2O, 99.5% trace metals basis
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Titanium, powder, −100 mesh, 99.7% trace metals basis
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Titanium(IV) oxide, rutile, ≥99.98% trace metals basis
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Titanium(IV) oxide, rutile, 99.995% trace metals basis
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Titanium(IV) oxide, contains 1% Mn as dopant, nanopowder, <100 nm particle size (BET), ≥97%
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Titanium, wire, diam. 0.25 mm, 99.7% trace metals basis
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Titanium, sponge, 1-20 mm, 99.5% trace metals basis
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Titanium, foil, thickness 2.0 mm, 99.7% trace metals basis
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Titanium, foil, thickness 0.025 mm, 99.98% trace metals basis
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Titanium, foil, thickness 0.5 mm, 99.99% trace metals basis
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Titanium, sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.995% trace metals basis
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Titanium, foil, thickness 0.127 mm, ≥99.99% trace metals basis
Sigma-Aldrich
Titanium, foil, thickness 0.25 mm, 99.99% trace metals basis
Sigma-Aldrich
Titanium(IV) oxide, rutile, <001>, (single crystal substrate), ≥99.9% trace metals basis, L × W × thickness 10 mm × 10 mm × 0.5 mm