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Merck
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Principaux documents

715166

Sigma-Aldrich

Octadecylphosphonic acid

97%

Synonyme(s) :

n-Octadecylphosphonic acid, ODPA

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About This Item

Formule empirique (notation de Hill):
C18H39O3P
Numéro CAS:
Poids moléculaire :
334.47
Numéro MDL:
Code UNSPSC :
12352300
ID de substance PubChem :
Nomenclature NACRES :
NA.23

Essai

97%

Forme

crystals

Pf

95-100 °C

Chaîne SMILES 

CCCCCCCCCCCCCCCCCCP(O)(O)=O

InChI

1S/C18H39O3P/c1-2-3-4-5-6-7-8-9-10-11-12-13-14-15-16-17-18-22(19,20)21/h2-18H2,1H3,(H2,19,20,21)

Clé InChI

FTMKAMVLFVRZQX-UHFFFAOYSA-N

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Description générale

Octadecylphosphonic acid (OPA) is used as a self-assembled monolayer that forms a surfactant which strongly bonds with the surface atoms of different metal oxides. It provides hydrophobic properties and covers a higher surface area than the predominantly used silanes.

Application

Anti-corrosive coatings on cupronickel (CuNi) can be formed by fabricating a protective film of OPA by dip coating method. OPA may be used in the preparation of indium oxide(In2O3) nanowire transistor than can find potential application in the growth of fast switching and low noise nano-electronic devices. It may be used for self-cleaning and oil/water separation based applications as it forms a superhydrophobic layer on the copper mesh.

Pictogrammes

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Mention d'avertissement

Warning

Mentions de danger

Classification des risques

Eye Irrit. 2 - Skin Irrit. 2

Code de la classe de stockage

11 - Combustible Solids

Classe de danger pour l'eau (WGK)

WGK 3


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Consulter la Bibliothèque de documents

Fabrication of controllable and stable In2O3 nanowire transistors using an octadecylphosphonic acid self-assembled monolayer.
Lim T, et al.
Nanotechnology, 26(14), 145203-145203 (2015)
Modification of cupronickel alloy surface with octadecylphosphonic acid self-assembled films for improved corrosion resistance.
Mioc K, et al.
Corrosion Science, 134(10), 189-198 (2018)
Getachew Tizazu et al.
Langmuir : the ACS journal of surfaces and colloids, 25(18), 10746-10753 (2009-07-18)
Electron-hole pair formation at titania surfaces leads to the formation of reactive species that degrade organic materials. Here, we describe the degradation of self-assembled monolayers of alkylphosphonic acids on the native oxide of titanium following exposure to UV light. The
n-Octadecylphosphonic acid grafted mesoporous magnetic nanoparticle: Preparation, characterization, and application in magnetic solid-phase extraction.
Ding J, et al.
Journal of Chromatography A, 1217(47), 7351-7358 (2010)
Fast formation of superhydrophobic octadecylphosphonic acid (ODPA) coating for self-cleaning and oil/water separation.
Dai C, et al.
Soft Matter, 10(40), 8116-8121 (2014)

Articles

There is widespread demand for thin, lightweight, and flexible electronic devices such as displays, sensors, actuators, and radio-frequency identification tags (RFIDs). Flexibility is necessary for scalability, portability, and mechanical robustness.

Self-assembled monolayers (SAMs) have attracted enormous interest for a wide variety of applications in micro- and nano-technology. In this article, we compare the benefits of three different classes of SAM systems (alkylthiolates on gold.

Notre équipe de scientifiques dispose d'une expérience dans tous les secteurs de la recherche, notamment en sciences de la vie, science des matériaux, synthèse chimique, chromatographie, analyse et dans de nombreux autres domaines..

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