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257222

Sigma-Aldrich

Triméthylaluminium

97%

Synonyme(s) :

Aluminium triméthyl, TMA

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About This Item

Formule linéaire :
(CH3)3Al
Numéro CAS:
75-24-1
Poids moléculaire :
72.09
Numéro Beilstein :
3587197
Numéro CE :
200-853-0
Numéro MDL:
MFCD00008252
Code UNSPSC :
12352103
ID de substance PubChem :
24855575
Nomenclature NACRES :
NA.23

Pression de vapeur

69.3 mmHg ( 60 °C)

Niveau de qualité

200

Description

heat of vaporization: ~41.9 kJ/mol (dimer)

Pureté

97%

Forme

liquid

Pertinence de la réaction

core: aluminum

Point d'ébullition

125-126 °C (lit.)
127 °C/760 mmHg
20 °C/8 mmHg
56 °C/50 mmHg

Pf

15 °C (lit.)

Densité

0.752 g/mL at 25 °C (lit.)

Chaîne SMILES 

C[Al](C)C

InChI

1S/3CH3.Al/h3*1H3;

Clé InChI

JLTRXTDYQLMHGR-UHFFFAOYSA-N

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Description générale

Trimethylaluminum (TMA) is a widely used precursor in the chemical vapor deposition (CVD) process to produce thin films in various applications. TMA is highly reactive and pyrophoric, which makes it an effective source of aluminum in thin film deposition processes to improve optoelectronic properties, such as enhanced light absorption and carrier transport characteristics.

Application

Trimethylaluminum can be used:
  • As a growth initiator to synthesize self-assembled aluminum nanoparticles via atomic layer deposition.
  • As a precursor to synthesize aluminum-doped ZnO thin films(AZO) for electron transport layer of perovskite solar cells. TMA enhances electrical conductivity and thermal stability of perovskite layers.
  • To fabricate Al2O3-coated Si-alloy anodes for Li-ion batteries. This coating helps to suppress the volume expansion of Si and improves cell stability.
  • To fabricate Al2O3-coated graphite electrode with superior anti-self-discharging behavior (260 h) with long stability (900 cycles), for Al-ion battery.

Conditionnement

Supplied in a Sure/Pac™ cylinder with a 1/4-turn bronze ball valve (Z122661) installed. This has a female 1/4"" NPT outlet thread and is closed with a male 1/4"" NPT carbon steel plug. The plug must be removed before use after ensuring the valve is in the closed position.

Compatible with the following:For instructions please refer to technical bulletin AL-136: The Aldrich Sure/Pac™ Cylinder System

Autres remarques

Storage below 20°C may cause crystallization.

Informations légales

Aldrich is a registered trademark of Sigma-Aldrich Co. LLC
Sure/Pac is a trademark of Sigma-Aldrich Co. LLC

Adaptateur d'entrée à septum

Réf. du produit
Description
Tarif

En option

Réf. du produit
Description
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Souvent commandé avec ce produit

Réf. du produit
Description
Tarif

Z221880

PTFE sealing tape, W 1 in.

Z104388

PTFE sealing tape, W 1/2 in.

Pictogrammes

FlameCorrosion
GHS02,GHS05

Mention d'avertissement

Danger

Mentions de danger

H250,H260,H314

Classification des risques

Eye Dam. 1 - Pyr. Liq. 1 - Skin Corr. 1B - Water-react 1

Risques supp

EUH014

Code de la classe de stockage

4.2 - Pyrophoric and self-heating hazardous materials

Classe de danger pour l'eau (WGK)

nwg

Point d'éclair (°F)

No data available

Point d'éclair (°C)

No data available

Équipement de protection individuelle

Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter

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Certificats d'analyse (COA)

Lot/Batch Number
SHBP2615
SHBP1162
SHBP0986
SHBL6474
SHBK6233

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Photo-induced current and its degradation in Al4C3/Al2O3 (0001) grown by metalorganic chemical vapor deposition
Kim D, et al.
Thin Solid Films, 557, 216-221 (2014)
Metalorganic chemical vapor deposition of Al2O3 using trimethylaluminum and O2 precursors: Growth mechanism and crystallinity
Liu X, et al.
Journal of Crystal Growth, 408, 78-84 (2014)
Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion
Oili ME, et al.
Thin Solid Films, 552, 124-135 (2014)
G R V de Sousa et al.
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