Skip to Content
Merck
All Photos(2)

Key Documents

View All Documentation

651796

Sigma-Aldrich

Negative photoresist I

Sign Into View Organizational & Contract Pricing
All Photos(2)

About This Item

CAS Number:
9003-31-0
MDL number:
MFCD00084438
UNSPSC Code:
41116107
NACRES:
NA.23

mol wt

average Mw 60,000-70,000 (polyisoprene)

Quality Level

100

composition

solids, 27-29 wt. %

dielectric constant

2.4

surface tension

29.2 dyn/cm

viscosity

465-535 cP(25 °C)

bp

122-142 °C (lit.)

density

0.89 g/mL at 25 °C (lit.)

λmax

310-480 nm

storage temp.

2-8°C

SMILES string

O1C(OCC(C1)(C)C)CCCCCCCC

InChI

1S/C14H28O2/c1-4-5-6-7-8-9-10-13-15-11-14(2,3)12-16-13/h13H,4-12H2,1-3H3

InChI key

UBZVSDZJBLSIJG-UHFFFAOYSA-N

Related Categories

General description

A stabilized, purified photoresist which exhibits superior resolution, adhesion, etch resistance and low pinhole density.
Available as part of Negative Photoresist kit 654892

Signal Word

Danger

Hazard Classifications

Acute Tox. 4 Dermal - Acute Tox. 4 Inhalation - Aquatic Chronic 3 - Asp. Tox. 1 - Eye Irrit. 2 - Flam. Liq. 3 - Repr. 1B - Skin Irrit. 2 - STOT SE 3

Target Organs

Respiratory system

Storage Class Code

3 - Flammable liquids

WGK

WGK 3

Flash Point(F)

75.2 °F - closed cup

Flash Point(C)

24 °C - closed cup

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Choose from one of the most recent versions:

Certificates of Analysis (COA)

Lot/Batch Number
MKCK5970
MKCJ2028
MKCG8986
MKCJ0922
MKCF2182

Don't see the Right Version?

If you require a particular version, you can look up a specific certificate by the Lot or Batch number.

Search for a COA

Already Own This Product?

Find documentation for the products that you have recently purchased in the Document Library.

Visit the Document Library

S M Al-Salem et al.
Journal of hazardous materials, 172(2-3), 1690-1694 (2009-08-29)
Thermo-chemical treatments (mainly pyrolysis) directed towards energy and products recovery provide a very promising alternative to open space disposal or landfilling, reducing in the process hazardous waste and potential contamination to soil and water resources. In this communication, we present
Stéphane Dubascoux et al.
Journal of chromatography. A, 1224, 27-34 (2012-01-17)
This paper presents results from the first analyses of the mesostructure of natural rubber (NR) by asymmetrical flow field flow fractionation (AF4). The results are compared with those obtained by size exclusion chromatography (SEC) in terms of average molar masses
S Wołoszczuk et al.
The European physical journal. E, Soft matter, 33(4), 343-350 (2010-12-02)
We simulate ABA triblock copolymer melts using a lattice Monte Carlo method, known as cooperative motion algorithm, probing various degrees of compositional asymmetry. Selected order-disorder transition lines are determined in terms of the segment incompatibility, quantified by product χN
Shunsuke Imai et al.
Enzyme and microbial technology, 49(6-7), 526-531 (2011-12-07)
Rubber-degrading bacteria were screened for the production of clearing zones around their colonies on latex overlay agar plates. Novel three bacteria, Streptomyces sp. strain LCIC4, Actinoplanes sp. strain OR16, and Methylibium sp. strain NS21, were isolated. To the best of
N Hambsch et al.
Journal of applied microbiology, 109(3), 1067-1075 (2010-04-23)
Natural rubber (poly-[cis-1,4-isoprene]) can be cleaved into 12-oxo-4,8-dimethyltrideca-4,8-diene-1-al by rubber oxygenase A (RoxA) isolated from Xanthomonas sp. RoxA is a novel type of dihaem dioxygenase with unknown cleavage mechanism of the rubber carbon backbone. Analysis of mutant RoxA after mutagenesis
View All Related Papers

Protocols

Negative Photoresist Procedure

Negative Photoresist Procedure

Global Trade Item Number

SKUGTIN
651796-100ML4061832732633

Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.

Contact Technical Service