774030

Zirkonium(IV)-oxid

sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.95% trace metals basis (excludes 2% HfO₂)

• Synonym(e): Zirkoniumdioxid
• Lineare Formel: ZrO₂
• CAS-Nummer: 1314-23-4
• Molekulargewicht: 123.22
• EG-Nummer: 215-227-2
• MDL-Nummer: MFCD00011310
• UNSPSC-Code: 12352300
• PubChem Substanz-ID: 329767656
• NACRES: NA.23

Eigenschaften

• Assay: 99.95% trace metals basis (excludes 2% HfO₂)
• Form: powder
• Eignung der Reaktion: core: zirconium
• Durchm. × Dicke: 2.00 in. × 0.25 in.
• bp: 5000 °C (lit.)
• mp (Schmelzpunkt): 2700 °C (lit.)
• Dichte: 5.89 g/mL at 25 °C (lit.)
• SMILES String: O=[Zr]=O
• InChI: 1S/2O.Zr
• InChIKey: MCMNRKCIXSYSNV-UHFFFAOYSA-N

Beschreibung

Anwendung

Solid Oxide Fuel cells operating at temperatures below 800 C (also known as intermediate temperature solid oxide fuel cell, IT-SOFC) are currently the topic of much research and development owing to the high degradation rates and materials costs incurred for SOFC operating at temperatures above 900 C. Thin films of electrode and electrolyte layers is one of the ways to achieve high performances in IT-SOFC.
Zirconium oxide sputtering target can be used for physical vapor deposition of zirconia thin films for IT-SOFC, thermal barrier coatings, lead zirconium titanate (PZT) films for sensor applications and other zirconium containing films for different applications.