749060
Zinc
sputtering target, diam. × thickness 3.00 in. × 0.125 in., 99.995% trace metals basis
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About This Item
Empirical Formula (Hill Notation):
Zn
CAS Number:
Molecular Weight:
65.39
EC Number:
MDL number:
UNSPSC Code:
12352103
PubChem Substance ID:
NACRES:
NA.23
vapor pressure
1 mmHg ( 487 °C)
Assay
99.995% trace metals basis
form
solid
resistivity
5.8 μΩ-cm, 20°C
diam. × thickness
3.00 in. × 0.125 in.
bp
907 °C (lit.)
mp
420 °C (lit.)
density
7.133 g/mL at 25 °C (lit.)
SMILES string
[Zn]
InChI
1S/Zn
InChI key
HCHKCACWOHOZIP-UHFFFAOYSA-N
Application
Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. It is commonly used for thin-film deposition, etching and analytical techniques.
Storage Class Code
11 - Combustible Solids
WGK
WGK 3
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