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534633

Sigma-Aldrich

PSS-(1-Propylmethacrylate)-Heptaisobutyl substituted

Synonym(s):

3-(3,5,7,9,11,13,15-Heptaisobutylpentacyclo[9.5.13,9.15,15.17,13]octasiloxan-1-yl)propylmethacrylate

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About This Item

Empirical Formula (Hill Notation):
C35H74O14Si8
CAS Number:
307531-94-8
Molecular Weight:
943.64
MDL number:
MFCD02683452
UNSPSC Code:
12162002
PubChem Substance ID:
329757946
NACRES:
NA.23

mp

108-112 °C (lit.)

Quality Level

100

SMILES string

CC(C)C[Si]12O[Si]3(CCCOC(=O)C(C)=C)O[Si]4(CC(C)C)O[Si](CC(C)C)(O1)O[Si]5(CC(C)C)O[Si](CC(C)C)(O2)O[Si](CC(C)C)(O3)O[Si](CC(C)C)(O4)O5

InChI

1S/C35H74O14Si8/c1-27(2)20-51-38-50(19-17-18-37-35(36)34(15)16)39-52(21-28(3)4)43-54(41-51,23-30(7)8)47-57(26-33(13)14)48-55(42-51,24-31(9)10)44-53(40-50,22-29(5)6)46-56(45-52,49-57)25-32(11)12/h27-33H,15,17-26H2,1-14,16H3

InChI key

CVYLJMBNVJQTGW-UHFFFAOYSA-N

Related Categories

General description

PSS-(1-Propylmethacrylate)-Heptaisobutyl substituted silsesquioxane (POSS) is a polyhedral oligomeric silsesquioxane (POSS) with an inorganic-organic cage-like architecture made up of silicon and oxygen.

Application

PSS-(1-Propylmethacrylate)-Heptaisobutyl substituted can be used as a functional monomer to prepare molecularly imprinted polymers or hybrid monolithic materials (MIPs) via reversible addition-fragmentation chain transfer polymerization (RAFT) or thermally initiated free radical polymerization reactions using suitable template molecules, cross-linker, porogenic solvent, and initiator. The resulting polymeric materials exhibited excellent polymer properties such as high thermal stability, high mechanical stability, low inflammability surface hardening, and oxidation resistance. These POSS nanostructural polymeric materials are commonly used in various biomedical applications, drug delivery, imaging reagents, catalyst supports, enzyme-like catalysis, solid-phase extraction, sensors, and in the chromatographic stationary phase.

Storage Class Code

11 - Combustible Solids

WGK

WGK 3

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

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Certificates of Analysis (COA)

Lot/Batch Number
MKCL1276
MKBW2808V
MKBT3779V
MKBN3809V
MKBG3189V

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PSS-Octavinyl substituted

Sigma-Aldrich

475424

PSS-Octavinyl substituted

Qing-Li Zhao et al.
Talanta, 152, 277-282 (2016-03-20)
Polyhedral oligomeric silsesquioxane (POSS) was successfully applied, for the first time, to prepare imprinted monolithic coating for capillary electrochromatography. The imprinted monolithic coating was synthesized with a mixture of PSS-(1-Propylmethacrylate)-heptaisobutyl substituted (MA 0702), S-amlodipine (template), methacrylic acid (functional monomer), and
Shu-Ping Gao et al.
Analytical and bioanalytical chemistry, 409(15), 3741-3748 (2017-03-28)
Polyhedral oligomeric silsesquioxane (POSS) was utilized to prepare imprinted polymer through reversible addition-fragmentation chain transfer polymerization (RAFT) successfully. The imprinted polymer was made with a mixture of RAFT agent, 4-vinylpyridine (4-VP), POSS monomer [PSS-(1-propylmethacrylate)-heptaisobutyl substituted, MA 0702], and ethylene glycol
Junjie Ou et al.
Analytica chimica acta, 761, 209-216 (2013-01-15)
A simple approach to fabricate hybrid monolithic column within the confines of fused-silica capillaries (75 μm i.d.) was introduced. A polyhedral oligomeric silsesquioxanes (POSS) reagent containing a methacrylate group was selected as functional monomer, and copolymerized with bisphenol A dimethacrylate

Global Trade Item Number

SKUGTIN
534633-5G4061832561325

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