8.18888

Xenon difluoride

for synthesis

• 同義詞: Xenon difluoride
• 經驗公式（希爾表示法）: F₂Xe
• CAS號碼: 13709-36-9
• 分子量：: 169.29
• MDL號碼: MFCD00040538
• 分類程式碼代碼: 12352307
• 酶委員會索引編號: 237-251-2
• NACRES: NA.22

屬性

• 蒸汽壓力: 3.8 hPa ( 25 °C)
• 品質等級: 200
• 形狀: crystals
• mp: 130-135 °C (sublimed)
• 儲存溫度: 2-8°C
• InChI: 1S/F2Xe/c1-3-2
• InChI 密鑰: IGELFKKMDLGCJO-UHFFFAOYSA-N

描述

應用

• Organic Laboratory Applications: Discusses how xenon difluoride interacts with organic substrates, highlighting its reaction mechanisms and versatility in organic synthesis (Ramsden, 2014).


• Aromatic Compounds Fluorination: Investigates the fluorination of aromatic compounds using xenon difluoride, emphasizing its advantages over elemental fluorine for safer and more controlled reactions (Fedorov et al., 2015).


• Microfabrication: Describes the use of xenon difluoride for dry etching in microfabrication, particularly for creating microelectromechanical systems by etching sacrificial silicon layers (Rowlands, 2015).


• Excitation Studies: Explores the excitation of Europium(III) in the presence of xenon difluoride, showing how xenon difluoride can assist in producing electronically excited states (Masyagutova et al., 2024).


• Etching of Sacrificial Layers: Details the application of xenon difluoride in the etching of sacrificial layers for the fabrication of microelectromechanical devices, demonstrating its effectiveness in creating complex structures (Vahanissi, 2019).

分析報告

Assay (iodometric): ≥ 98.0 %

安全資訊

• 象形圖: GHS03,GHS05,GHS06
• 訊號詞: Danger
• 危險聲明: H272 - H301 - H314 - H330
• 防範說明: P210 - P260 - P280 - P303 + P361 + P353 - P304 + P340 + P310 - P305 + P351 + P338
• 危險分類: Acute Tox. 1 Inhalation - Acute Tox. 3 Oral - Eye Dam. 1 - Ox. Sol. 2 - Skin Corr. 1B
• 儲存類別代碼: 5.1B - Oxidizing hazardous materials
• 水污染物質分類（WGK）: WGK 3
• 閃點（°F）: Not applicable
• 閃點（°C）: Not applicable