品質等級
形狀
liquid
成份
alcohol / glycol mixture (solvent)
濃度
20 wt. % Ag
20 wt. %±1% (Silver content)
電阻係數
5-10 μΩ-cm, after curing by photonic curing for less than 100ms, 3.2 - 6.3 Nb bulk silver
5.4 μΩ-cm, after curing in furnace at 200° C for 5 minutes, 3.4 Nb bulk silver
5.8 μΩ-cm, after curing in furnace at 180° C for 5 minutes, 3.6 Nb bulk silver
6-12 μΩ-cm, after curing by NIR for a few seconds, 3.8 - 7.5 Nb bulk silver
6.6 μΩ-cm, after curing in furnace at 150° C for 5 minutes, 4.1 Nb bulk silver
薄層電阻
13.5 m Ω/sq, 25 mum after curing at 200 Celsius for 5 min on glass
16.5 m Ω/sq, 25 mum after curing at 150 Celsius for 5 min on glass
顏色
brown, Brown to Very Dark Brown and Faint Grey to Very Dark Grey and Black
表面張力
24 mN/m±3 mN/m
黏度
12 mPa.s±3%(20 °C) (@100/s)
密度
1.1 g/cm3
儲存溫度
2-8°C
應用
This ink has been developed to allow photonical curing to enable high throughput printing.
Compatible Printing Method: inkjet printing
Compatible Print heads: RICOH (MH5420), XAAR (1003 GS6, 128), KONIKA MINOLTA (KM512SHx, KM1024iMHE, KM1024LHB), FUJIFILM (Dimatix DMP series cartridge)
Compatible substrates: PET (Melinex 406, Melinex 339, Melines 520, Arcophane TCA, Arcophane STS, Folex BG-71), PEN (Teonex), Kapton® , Ceramic
Recommended surface treatment for substrates:
- Temperature stabilization
- Argon plasma treatment
特點和優勢
- Improved conductivity
- Superior resolution (increased with substrate surface treatment)
- Good bending resistance, smooth surface
- Shiny coating, mirror effect
- Optimized nano-particle content
- Curing process compatibility: photonic, NIR, low vacuum oven, thermal curing
- Cleaning solution: C-FS21511
- Non-toxic (No CMR ink)
法律資訊
訊號詞
Danger
危險分類
Aquatic Acute 1 - Aquatic Chronic 1 - Eye Dam. 1 - Flam. Liq. 3 - Skin Irrit. 2
儲存類別代碼
3 - Flammable liquids
水污染物質分類(WGK)
WGK 3
閃點(°F)
140.0 °F
閃點(°C)
60 °C
分析證明 (COA)
輸入產品批次/批號來搜索 分析證明 (COA)。在產品’s標籤上找到批次和批號,寫有 ‘Lot’或‘Batch’.。
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