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774022

Sigma-Aldrich

氧化钇(III)

sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.99% trace metals basis

同義詞:

氧化钇

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About This Item

線性公式:
Y2O3
CAS號碼:
分子量::
225.81
EC號碼:
MDL號碼:
分類程式碼代碼:
12352302
PubChem物質ID:
NACRES:
NA.23

化驗

99.99% trace metals basis

形狀

powder

反應適用性

core: yttrium

直徑× 厚度

2.00 in. × 0.25 in.

mp

2410 °C (lit.)

密度

5.01 g/mL at 25 °C (lit.)

SMILES 字串

O=[Y]O[Y]=O

InChI

1S/3O.2Y

InChI 密鑰

SIWVEOZUMHYXCS-UHFFFAOYSA-N

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應用

Solid Oxide Fuel cells operating at temperatures below 800 C (also known as intermediate temperature solid oxide fuel cell, IT-SOFC) are currently the topic of much research and development owing to the high degradation rates and materials costs incurred for SOFC operating at temperatures above 900 C. Thin films of electrode and electrolyte layers is one of the ways to achieve high performances in IT-SOFC.
Yttrium oxide sputtering target can be used for physical vapor deposition of thin films of yttria stabilized zirconia layers for IT-SOFC. Yttrium containing films are used as thermal barrier and protective coatings in thermoelectric devices, rare earth doped yttrium oxide films are studied for phosphor applications.

儲存類別代碼

13 - Non Combustible Solids

水污染物質分類(WGK)

WGK 1

閃點(°F)

Not applicable

閃點(°C)

Not applicable


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文章

Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition

Spin-based electronic (spintronic) devices offer significant improvement to the limits of conventional charge-based memory and logic devices which suffer from high power usage, leakage current, performance saturation, and device complexity.

The properties of many devices are limited by the intrinsic properties of the materials that compose them.

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