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Key Documents

679321

Sigma-Aldrich

正丙基三乙氧基硅烷

≥98%, deposition grade

同義詞:

Triethoxypropylsilane

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About This Item

線性公式:
(C2H5O)3SiCH2CH2CH3
CAS號碼:
分子量::
206.35
EC號碼:
MDL號碼:
分類程式碼代碼:
12352103
PubChem物質ID:
NACRES:
NA.23

等級

deposition grade

化驗

≥98%

形狀

liquid

折射率

n20/D 1.396 (lit.)

bp

179-180 °C (lit.)

密度

0.892 g/mL at 25 °C (lit.)

SMILES 字串

CCC[Si](OCC)(OCC)OCC

InChI

1S/C9H22O3Si/c1-5-9-13(10-6-2,11-7-3)12-8-4/h5-9H2,1-4H3

InChI 密鑰

NBXZNTLFQLUFES-UHFFFAOYSA-N

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象形圖

FlameExclamation mark

訊號詞

Warning

危險聲明

危險分類

Flam. Liq. 3 - Skin Irrit. 2

儲存類別代碼

3 - Flammable liquids

水污染物質分類(WGK)

WGK 2

閃點(°F)

137.3 °F - closed cup

閃點(°C)

58.5 °C - closed cup

個人防護裝備

Eyeshields, Gloves, type ABEK (EN14387) respirator filter


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分析證明 (COA)

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Yueer Yan et al.
Chemistry (Weinheim an der Bergstrasse, Germany), 21(34), 12161-12170 (2015-07-16)
A clear and deep understanding of zeolite crystallization with the addition of organosilane is desirable for the reasonable design and preparation of hierarchical zeolites. Herein, the effects of different organosilanes on zeolite crystallization were systematically studied. It was found that
Céline Hubert et al.
Faraday discussions, 181, 139-146 (2015-04-30)
Silica particles with a controlled number of entropic patches, i.e. dimples, are synthesized through the growth of the silica core of binary multipods that have been produced by a seeded-growth emulsion polymerization reaction. Transmission electron microscopy studies indicate that the

文章

Deposition Grade Silanes, fully characterized by chemical analysis and nuclear magnetic resonance (NMR) with greater than 98% purity, for Sol-Gel Processes.

Mesoporous Oxides and Their Applications to Hydrogen Storage

Silica is a very popular inorganic nanomaterial used in a wide range of applications including fillers for rubber, catalyst supports, separation media, carriers in food and agriculture, and abrasive/anticaking agents in cosmetics. It is also widely believed to be an important material for biomedical applications for following reasons.

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