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469130

Sigma-Aldrich

硫酸铜 五水合物

99.995% trace metals basis

同義詞:

Cupric sulfate 五水合物, 硫酸,铜(II)盐(1:1)五水合物

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About This Item

線性公式:
CuSO4 · 5H2O
CAS號碼:
分子量::
249.69
EC號碼:
MDL號碼:
分類程式碼代碼:
12352302
PubChem物質ID:
NACRES:
NA.23

蒸汽壓力

7.3 mmHg ( 25 °C)

品質等級

化驗

99.995% trace metals basis

形狀

crystalline

反應適用性

reagent type: catalyst
core: copper

雜質

≤0.001% N compounds
≤0.005% insolubles
<50 ppm total metallic impurities

mp

110 °C (dec.) (lit.)

負離子痕跡

chloride (Cl-): ≤0.001%

正離子痕跡

Ca: ≤0.005%
Fe: ≤0.003%
K: ≤0.01%
Na: ≤0.02%
Ni: ≤0.005%

應用

battery manufacturing

SMILES 字串

O.O.O.O.O.[Cu++].[O-]S([O-])(=O)=O

InChI

1S/Cu.H2O4S.5H2O/c;1-5(2,3)4;;;;;/h;(H2,1,2,3,4);5*1H2/q+2;;;;;;/p-2

InChI 密鑰

JZCCFEFSEZPSOG-UHFFFAOYSA-L

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應用

硫酸铜(II)五水合物盐可用于通过化学还原法制造铜纳米粒子。五水合铜盐可用作催化剂,用于通过醛肟将芳族醛转化为伯酰胺。硫酸铜(II)五水合物和石墨前体可用于制备还原氧化石墨烯铜纳米粒子(rGO/CuNP)。含有 CuSO4.5H2O 的水溶液电解液可用于制备 Cu2ZnSnS4 (CZTS)薄膜太阳能电池。六水三氯化铁(FeCl3.6H2O)和硫酸铜(II)五水合物(CuSO4.5H2O)可用于制造制造 Fe-Cu 二元氧化物吸附剂,可用于除砷应用。

訊號詞

Danger

危險聲明

危險分類

Acute Tox. 4 Oral - Aquatic Acute 1 - Aquatic Chronic 1 - Eye Dam. 1

儲存類別代碼

13 - Non Combustible Solids

水污染物質分類(WGK)

WGK 3

閃點(°F)

Not applicable

閃點(°C)

Not applicable

個人防護裝備

dust mask type N95 (US), Eyeshields, Faceshields, Gloves


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存取文件庫

An efficient copper (II)-catalyzed direct access to primary amides from aldehydes under neat conditions.
Ganguly NC, et al.
Tetrahedron Letters, 53(11), 1413-1416 (2012)
Nanostructured iron (III)-copper (II) binary oxide: a novel adsorbent for enhanced arsenic removal from aqueous solutions.
Zhang G, et al.
Water Research, 47(12), 4022-4031 (2013)
Synthesis and characterization of copper nanoparticles supported on reduced graphene oxide as a highly active and recyclable catalyst for the synthesis of formamides and primary amines
Fakhri P, et al.
J. Mol. Catal. A: Chem., 383?384, 17-22 (2014)
Synthesis and optical properties of copper nanoparticles prepared by a chemical reduction method.
Dang TMD, et al.
Nanoscience and Nanotechnology, 2(1), 015009-015009 (2011)
Cu2 ZnSnS 4 thin films and nanowires prepared by different single-step electrodeposition method in quaternary electrolyte.
Jeon M, et al.
Materials Letters, 65(15), 2364-2367 (2011)

文章

In many technologies, performance requirements drive device dimensions below the scale of electron mean free paths (λe). This trend has increased scientific interest and technological importance of electrical resistivities at the nanoscale.

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