推薦產品
包含
200 ppm monomethyl ether hydroquinone as inhibitor
350 ppm BHT as inhibitor
折射率
n20/D 1.473 (lit.)
密度
1.14 g/mL at 25 °C (lit.)
儲存溫度
2-8°C
SMILES 字串
CC(=C)C(=O)OCC(O)COC(=O)C=C
InChI
1S/C10H14O5/c1-4-9(12)14-5-8(11)6-15-10(13)7(2)3/h4,8,11H,1-2,5-6H2,3H3
InChI 密鑰
ZODNDDPVCIAZIQ-UHFFFAOYSA-N
應用
- 二氧化硅表面仲氨基与3-丙烯酰氧-2-甲基丙烯酸羟丙酯的迈克尔加成反应的光谱分析:该研究讨论了通过AHM的迈克尔加成反应将可聚合的甲基丙烯酸基团引入二氧化硅表面,观察了随摩尔比增加而增加的官能团数目(S Lee, KR Ha, 2014)。
- 通过RAFT非水乳液聚合合成结构规整的二嵌段共聚物纳米物体:该论文详细介绍了通过RAFT聚合在非水介质中合成结构规整的二嵌段共聚物纳米物体,重点介绍了甲基丙烯酸酯共聚物在构建定制纳米结构中的多功能性(RR Gibson, A Fernyhough, OM Musa, SP Armes, 2021)。
- 通过Aza-Michael加成反应引入二氧化硅颗粒表面的甲基丙烯酸酯基团的光谱分析:该论文探索了采用AHM以甲基丙烯酸酯基团对二氧化硅颗粒进行功能化修饰,重点关注了通过光谱分析评估的接枝效率 (S Lee, KR Ha, 2016)。
- 基于通过RAFT聚合法合成的半胱氨酸甲基丙烯酸酯的抗菌和响应性两性离子聚合物: 讨论了一种以半胱氨酸和AHM通过thiol-Michael反应合成的响应性、抗菌两性离子聚合物,该聚合物适用于抗菌应用(P Yadav, S Hafeez, J Jaishankar, P Srivastava, 2021)。
訊號詞
Danger
危險聲明
危險分類
Eye Dam. 1 - Skin Irrit. 2 - Skin Sens. 1
儲存類別代碼
10 - Combustible liquids
水污染物質分類(WGK)
WGK 3
閃點(°F)
235.4 °F - closed cup
閃點(°C)
113 °C - closed cup
個人防護裝備
Eyeshields, Faceshields, Gloves, type ABEK (EN14387) respirator filter
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