484016
Potassium hydroxide
reagent grade, 90%, flakes
Synonym(s):
Caustic potash
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About This Item
Recommended Products
grade
reagent grade
Quality Level
Agency
suitable for EPA 1613
suitable for SM 5210
vapor pressure
1 mmHg ( 719 °C)
Assay
90%
form
flakes
pH
~13.5 (25 °C, 5.6 g/L)
mp
361 °C (lit.)
solubility
water: soluble 1120 g/L
SMILES string
[OH-].[K+]
InChI
1S/K.H2O/h;1H2/q+1;/p-1
InChI key
KWYUFKZDYYNOTN-UHFFFAOYSA-M
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General description
Potassium hydroxide (KOH) is a hygroscopic, water soluble base synthesized by the electrolysis of potassium chloride solution. It is the raw material for the synthesis of many potassium compounds. KOH reacts with CO2 to form potassium carbonate. This property can be utilized to absorb CO2. It participates as catalyst in aldol condensation reactions. KOH anisotropic etching of silicon is used for the fabrication of sub-micron silicon nitride waveguides using conventional contact lithography. Pulverized KOH may be used for the preparation of chalcones.
Application
Potassium hydroxide (KOH) was used in the following processes:
- Quantification of glutathione (GSH) and glutathione disulfide (GSSG) in biological samples by HPLC.
- Preparation of buffer for use in the Investigation of seed fatty acid (FA) composition, protein, oil and sugar content.
- Stable isotopic profiling study of Caenorhabditis elegans.
Signal Word
Danger
Hazard Statements
Precautionary Statements
Hazard Classifications
Acute Tox. 4 Oral - Eye Dam. 1 - Met. Corr. 1 - Skin Corr. 1A
Storage Class Code
8B - Non-combustible corrosive hazardous materials
WGK
WGK 1
Flash Point(F)
Not applicable
Flash Point(C)
Not applicable
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We demonstrate a novel technique to fabricate sub-micron silicon nitride waveguides using conventional contact lithography with MEMS-grade photomasks. Potassium hydroxide anisotropic etching of silicon facilitates line reduction and roughness smoothing and is key to the technique. The fabricated waveguides is
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