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Key Documents

NIST2133

Phosphorus implant in silicon depth profile standard

NIST® SRM® 2133

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About This Item

分類程式碼代碼:
41116107
NACRES:
NA.24

等級

certified reference material

品質等級

包裝

pkg of each

製造商/商標名

NIST®

應用

semiconductor

格式

matrix material

一般說明

This Standard Reference Material (SRM) is intended for use in calibrating secondary ion response to minor and trace levels of phosphorus in a silicon matrix by the analytical technique of secondary ion mass spectrometry (SIMS). SRM 2133 is intended for calibrating the response of a SIMS instrument for phosphorus in a silicon matrix under a specific set of instrumental conditions. It may also be used by a laboratory as a transfer standard for the calibration of working standards of phosphorus in silicon. This SRM consists of a 1 cm × 1 cm single crystal silicon substrate that has been ion-implanted with the isotope 31P at a nominal energy of 100 keV. For more information, please refer to the COA and SDS.

SRM 2133_cert

SRM 2133_SDS

其他說明

Example analytes are listed below as a reference. Please download a current certificate at nist.gov/SRM for current analytes and certified values.
Phosphorus (31P)

法律資訊

NIST is a registered trademark of National Institute of Standards and Technology
SRM is a registered trademark of National Institute of Standards and Technology

儲存類別代碼

13 - Non Combustible Solids

水污染物質分類(WGK)

WGK 3

閃點(°F)

Not applicable

閃點(°C)

Not applicable


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分析证书(COA)

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