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蒸汽密度
1 (vs air)
蒸汽壓力
23.3 mmHg ( 30 °C)
化驗
99.999% trace metals basis
形狀
liquid
包含
potassium stannate as inhibitor
stabilizer
反應適用性
reagent type: oxidant
濃度
30-32 wt. % in water, semiconductor grade
密度
1.11 g/mL at 25 °C
儲存溫度
2-8°C
SMILES 字串
OO
InChI
1S/H2O2/c1-2/h1-2H
InChI 密鑰
MHAJPDPJQMAIIY-UHFFFAOYSA-N
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相关类别
一般說明
Hydrogen peroxide solution is a widely used oxidizing agent in a variety of applications, including the oxidation of cyanide in industrial waste samples, the removal of ammonia from semiconductor wastewater, the removal of ibuprofen from water and wastewater, and the treatment of wastewater containing five-membered heterocyclic pyrazoles. It is one of the most widely used wet electronic chemicals.
應用
Hydrogen peroxide solution can be used in the substrate preparation for ultrathin polymer films.
訊號詞
Danger
危險聲明
危險分類
Aquatic Chronic 3 - Eye Dam. 1
儲存類別代碼
5.1B - Oxidizing hazardous materials
水污染物質分類（WGK）
WGK 1
閃點（°F）
Not applicable
閃點（°C）
Not applicable
個人防護裝備
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
Optimized methods for obtaining cellulose and cellulose sulfates from birch wood
Kuznetsov BN, et al.
Wood Science and Technology, 49(4), 825-843 null
MiR-34 modulates Caenorhabditis elegans lifespan via repressing the autophagy gene atg9
Yang J, et al.
Age (Dordrecht, Netherlands), 35(1), 11-22 (2013)
Ibuprofen elimination from water and wastewater using sonication/ultraviolet/hydrogen peroxide/zeolite-titanate photocatalyst system
Farhadi N, et al.
Environmental Research, 198, 111260-111260 (2021)
Fabrication of large-area free-standing ultrathin polymer films
Stadermann M, et al.
Journal of Visualized Experiments, e52832-e52832 (2015)
Brazdil, J.F. et al.
Chemistry of Materials, 10, 4100-4100 (1998)
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