所有图片(2)
About This Item
线性分子式:
Ta(N(CH3)2)5
CAS号:
分子量:
401.33
MDL號碼:
分類程式碼代碼:
12352103
PubChem物質ID:
NACRES:
NA.23
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品質等級
化驗
99.99%
形狀
solid
反應適用性
core: tantalum
reagent type: catalyst
mp
100 °C (dec.) (lit.)
SMILES 字串
CN(C)[Ta](N(C)C)(N(C)C)(N(C)C)N(C)C
InChI
1S/5C2H6N.Ta/c5*1-3-2;/h5*1-2H3;/q5*-1;+5
InChI 密鑰
VSLPMIMVDUOYFW-UHFFFAOYSA-N
一般說明
基材原子数:73 钽
特點和優勢
氮化钽 (TaN) 薄膜的挥发性固体 CVD 前体。当在沉积过程中存在 O2、H2O、NO 或 H2O2 时,还会形成氧化钽 (Ta2O5) 薄膜。 Ta2O5 薄膜作为集成电路制造中的栅电介质材料具有广阔的应用前景。
訊號詞
Danger
危險聲明
危險分類
Eye Dam. 1 - Flam. Sol. 1 - Skin Corr. 1B - Water-react 1
儲存類別代碼
4.3 - Hazardous materials which set free flammable gases upon contact with water
水污染物質分類(WGK)
WGK 3
閃點(°F)
Not applicable
閃點(°C)
Not applicable
個人防護裝備
Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges
其他客户在看
James E Maslar et al.
Applied spectroscopy, 74(10), 1219-1229 (2019-10-17)
A nondispersive infrared gas analyzer was demonstrated for investigating metal alkylamide precursor delivery for microelectronics vapor deposition processes. The nondispersive infrared analyzer was designed to simultaneously measure the partial pressure of pentakis(dimethylamido) tantalum, a metal precursor employed in high volume
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