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About This Item
线性分子式:
RuO2 · xH2O
CAS号:
分子量:
133.07 (anhydrous basis)
EC號碼:
MDL號碼:
分類程式碼代碼:
12161600
PubChem物質ID:
NACRES:
NA.22
推荐产品
品質等級
化驗
99.9% trace metals basis
形狀
powder
反應適用性
core: ruthenium
reagent type: catalyst
SMILES 字串
O.O=[Ru]=O
InChI
1S/H2O.2O.Ru/h1H2;;;
InChI 密鑰
FGEKTVAHFDQHBU-UHFFFAOYSA-N
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訊號詞
Warning
危險聲明
危險分類
Eye Irrit. 2
儲存類別代碼
11 - Combustible Solids
水污染物質分類（WGK）
WGK 3
閃點（°F）
Not applicable
閃點（°C）
Not applicable
個人防護裝備
dust mask type N95 (US), Eyeshields, Gloves
Ramin M A Tehrani et al.
Biosensors & bioelectronics, 38(1), 278-283 (2012-06-30)
A non-enzymatic glucose sensor of multi-walled carbon nanotube-ruthenium oxide/composite paste electrode (MWCNT-RuO(2)/CPE) was developed. The electrode was characterized by using XRD, SEM, TEM and EIS. Meanwhile, cyclic voltammetry and amperometry were used to check on the performances of the MWCNT-RuO(2)/CPE
Guolei Xiang et al.
Scientific reports, 2, 801-801 (2012-11-13)
Controls over the atomic dispersity and particle shape of noble metal catalysts are the major qualities determining their usability in industrial runs, but they are usually difficult to be simultaneously realized. Inspired from the Deacon catalyst in which RuO(2) can
Todd P Luxton et al.
Journal of colloid and interface science, 359(1), 30-39 (2011-04-23)
Ruthenium oxides (RuO(2)·1·10H(2)O and RuO(2)) have been synthesized by forced hydrolysis and oxidation of ruthenium chloride. The resulting materials were extensively characterized to determine the crystallinity, surface area, and ruthenium oxidation state. Surface charging experiments indicate a large quantity of
Jelena Radjenovic et al.
Water research, 45(4), 1579-1586 (2010-12-21)
During membrane treatment of secondary effluent from wastewater treatment plants, a reverse osmosis concentrate (ROC) containing trace organic contaminants is generated. As the latter are of concern, effective and economic treatment methods are required. Here, we investigated electrochemical oxidation of
Dong-Jin Yun et al.
ACS applied materials & interfaces, 4(9), 4588-4594 (2012-08-23)
RuO(2) films were deposited on SiO(2) (300 nm)/N++Si substrates using radio frequency magnetron sputtering at room temperature. As-deposited RuO(2) films were annealed at different temperatures (100, 300, and 500 °C) and ambients (Ar, O(2) and vacuum), and the resulting effects
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