725544
Tetrakis(ethylmethylamido)hafnium(IV)
packaged for use in deposition systems
Synonym(s):
TEMAH, Tetrakis(ethylmethylamino)hafnium(IV)
About This Item
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Quality Level
form
liquid
reaction suitability
core: hafnium
reagent type: catalyst
bp
78 °C/0.01 mmHg (lit.)
mp
<-50 °C
density
1.324 g/mL at 25 °C (lit.)
storage temp.
2-8°C
SMILES string
CCN(C)[Hf](N(C)CC)(N(C)CC)N(C)CC
InChI
1S/4C3H8N.Hf/c4*1-3-4-2;/h4*3H2,1-2H3;/q4*-1;+4
InChI key
NPEOKFBCHNGLJD-UHFFFAOYSA-N
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General description
Application
TEMAH is well-suited for ALD because its adsorption is self-limiting on a number of substrates including glass, indium-tin oxide(ITO), Si(100), and two-dimensional materials like MoS2. TEMAH also conveniently reacts with either water or ozone as the oxygen-source in the ALD process.
Features and Benefits
- Steel cylinder connected to 316 stainless steelball-valve
- 1/4 inch male Swagelok VCR connections
Signal Word
Danger
Hazard Statements
Precautionary Statements
Hazard Classifications
Acute Tox. 4 Oral - Eye Dam. 1 - Flam. Liq. 2 - Skin Corr. 1B - STOT SE 3 - Water-react 1
Target Organs
Respiratory system
Supplementary Hazards
Storage Class Code
4.3 - Hazardous materials which set free flammable gases upon contact with water
WGK
WGK 3
Flash Point(F)
51.8 °F - closed cup
Flash Point(C)
11 °C - closed cup
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