316989
Hydrogen peroxide solution
contains potassium stannate as inhibitor, 30-32 wt. % in water, semiconductor grade, 99.999% trace metals basis
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About This Item
Empirical Formula (Hill Notation):
H2O2
CAS Number:
Molecular Weight:
34.01
Beilstein:
3587191
MDL number:
UNSPSC Code:
12352300
PubChem Substance ID:
Recommended Products
vapor density
1 (vs air)
vapor pressure
23.3 mmHg ( 30 °C)
Assay
99.999% trace metals basis
form
liquid
contains
potassium stannate as inhibitor
stabilizer
reaction suitability
reagent type: oxidant
concentration
30-32 wt. % in water, semiconductor grade
density
1.11 g/mL at 25 °C
storage temp.
2-8°C
SMILES string
OO
InChI
1S/H2O2/c1-2/h1-2H
InChI key
MHAJPDPJQMAIIY-UHFFFAOYSA-N
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General description
Hydrogen peroxide solution is a widely used oxidizing agent in a variety of applications, including the oxidation of cyanide in industrial waste samples, the removal of ammonia from semiconductor wastewater, the removal of ibuprofen from water and wastewater, and the treatment of wastewater containing five-membered heterocyclic pyrazoles. It is one of the most widely used wet electronic chemicals.
Application
Hydrogen peroxide solution can be used in the substrate preparation for ultrathin polymer films.
Signal Word
Danger
Hazard Statements
Precautionary Statements
Hazard Classifications
Aquatic Chronic 3 - Eye Dam. 1
Storage Class Code
5.1B - Oxidizing hazardous materials
WGK
WGK 1
Flash Point(F)
Not applicable
Flash Point(C)
Not applicable
Personal Protective Equipment
dust mask type N95 (US), Eyeshields, Gloves
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Yang J, et al.
Age (Dordrecht, Netherlands), 35(1), 11-22 (2013)
Ibuprofen elimination from water and wastewater using sonication/ultraviolet/hydrogen peroxide/zeolite-titanate photocatalyst system
Farhadi N, et al.
Environmental Research, 198, 111260-111260 (2021)
Fabrication of large-area free-standing ultrathin polymer films
Stadermann M, et al.
Journal of Visualized Experiments, e52832-e52832 (2015)
Brazdil, J.F. et al.
Chemistry of Materials, 10, 4100-4100 (1998)
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