Skip to Content
Merck
All Photos(2)

Key Documents

View All Documentation

697540

Sigma-Aldrich

Trimethyl(methylcyclopentadienyl)platinum(IV)

packaged for use in deposition systems

Synonym(s):

MeCpPtMe3

Sign Into View Organizational & Contract Pricing
All Photos(2)

About This Item

Linear Formula:
C5H4CH3Pt(CH3)3
CAS Number:
94442-22-5
Molecular Weight:
319.30
UNSPSC Code:
12352103
NACRES:
NA.23

form

low-melting solid

reaction suitability

core: platinum
reagent type: catalyst

mp

30-31 °C (lit.)

storage temp.

2-8°C

SMILES string

C[Pt](C)C.C[C]1[CH][CH][CH][CH]1

InChI

1S/C6H7.3CH3.Pt/c1-6-4-2-3-5-6;;;;/h2,4H,3H2,1H3;3*1H3;

InChI key

AGQKROMSWCHOND-UHFFFAOYSA-N

Looking for similar products? Visit Product Comparison Guide

General description

Trimethyl(methylcyclopentadienyl)platinum(IV) pale yellow or off-white crystalline organometallic complex widely used as a chemical vapor deposition/atomic layer deposition precursor to deposit platinum on various substrates.

Application

Trimethyl(methylcyclopentadienyl)platinum(IV) used:
  • As a precursor to prepare Pt nanoparticles. It helps in tuning the particle size for better activity and stability of the Pt catalyst.
  • To fabricate cathodes for solid acid fuel cells with high activity and excellent stability.
  • To prepare triple helical nanowires(THN) for advanced nanophotonics.
  • To fabricate Pt current collectors for electrodes of asymmetric V2O5–SnO2 nanopore battery.
  • As a precursor for synthesis of Platinum catalystwith high loadings of uniform-sized, 1−2 nm Ptnanoparticles on high surface area Al2O3, TiO2, and SrTiO3 supports. The synthesis ofcatalytic nanoparticles via ALD is a compelling technique for creatinginnovative and useful catalysts.
Precursors Packaged for Depositions Systems

Pictograms

Skull and crossbonesEnvironment
GHS06,GHS09

Signal Word

Danger

Hazard Statements

H300 + H310,H317,H400

Hazard Classifications

Acute Tox. 1 Oral - Acute Tox. 2 Dermal - Aquatic Acute 1 - Skin Sens. 1

Storage Class Code

6.1A - Combustible acute toxic Cat. 1 and 2 / very toxic hazardous materials

WGK

WGK 3

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Choose from one of the most recent versions:

Certificates of Analysis (COA)

Lot/Batch Number
SHBK6250
SHBJ8097
SHBJ3328
SHBF3198V
SHBH9568

Don't see the Right Version?

If you require a particular version, you can look up a specific certificate by the Lot or Batch number.

Search for a COA

Already Own This Product?

Find documentation for the products that you have recently purchased in the Document Library.

Visit the Document Library

Articles

The Savannah ALD System - An Excellent Tool for Atomic Layer Deposition

Atomic Layer Deposition (ALD) is a coating technology that allows perfectly conformal deposition onto complex 3D surfaces. The reason for this uniform coating lies in the saturative chemisorption of sequential cycles of precursor vapors.

Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition

Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition

Dye-Sensitized and Perovskite Solar Cells: Interface Engineering by Atomic Layer Deposition

Since the demonstration of the first practical solar cell 60 years ago, research on novel materials, improved solar cell design and structure, and innovative manufacturing processes have all contributed to a continuous increase in the efficiency of photovoltaic (PV) devices.

FePt Nanogranular films for high density heat-assisted magnetic recording

A hard disk drive (HDD) is a data storage device that stores digital information by magnetizing nanosized magnets on flat disks and retrieves data by sensing the resulting magnetic field.

See All

Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.

Contact Technical Service