Skip to Content
Merck
All Photos(1)

Documents

651826

Sigma-Aldrich

Chromium etchant

standard

Synonym(s):

Cr etching solution

Sign Into View Organizational & Contract Pricing
All Photos(1)

About This Item

MDL number:
MFCD07370678
UNSPSC Code:
12352300
NACRES:
NA.23

grade

standard

composition

volatiles, 85%

color

orange

bp

100 °C/1 atm

density

1.16 g/mL at 25 °C

General description

  • Appearance - Clear orange
  • pH - Acidic
  • Etch Rate at 40 °C - 40 Å/second
  • Etch Capacity (rate declines at ~70%) - 65 g/gallon
  • Shelf Life - 1 year
  • Storage Conditions - Ambient
  • Filtration - 0.2 µm
  • Recommended Operating Temperatures - 20-80 °C (30-40 °C most common)
  • Rinse - Deionized water
  • Photoresist Recommendations - KLT6000 Series, KLT 5300 Series, HARE SQT (SU-8 type), TRANSIST, or PKP -308PI
  • Select Compatible Materials - Au, Ti, oxide, nitride, Si
  • Select Incompatible Materials - Al, Ni, Cu, NiCr
  • Compatible Plastics - HDPE, PP, PTFE, PFA, PVC
  • Isotropy - Isotropic
  • Incompatible Chemicals - Strong bases
Ceric ammonium nitrate-based etchant. Etch rate of 40 Å/sec @ room temp. Etches cleanly with only a deionized water rinse needed.
Chromium etchant is a chromium based solution that removes the excess metal from the substrate. These etchants are majorly used in metal finishing and electronic industry. It has an etch rate of 4 mm/s and can be used to etch nickel, copper, and chromium based excess metals.
Our chromium etchant is high purity ceric ammonium nitrate system for precise, clean etching of chromium and chromium oxide films. Compatible with positive and negative photoresists. Our chromium etchant is filtered to remove all particulates above 0.2 microns. Etching temperature varies depending on film thickness. Etch times range from 15 seconds to 60 seconds at room temperature. Chromium Etchants should be operated in a well-ventilated hood.

Application

The product can etch Al, Cr, Cu, Ni, GaAs. It can surface oxidize Si, Ta/TaN, however, it has no effect on Au, Si3N4, SiO2, Ti, and W surfaces
For use at room temperature or elevated temperature. Etches cleanly, eliminating need for an intermediate rinse. Etching temperature varies with regard to film thickness. Etch times range from 15 to 60 seconds at room temperature. Note, chromium etchants should be handled in a well ventilated hood.

Features and Benefits

Designed for precise, clean etching of chromium and chromium oxide films. Compatible with both positive and negative photoresists. Filtered to 0.2 micron to remove particlulates.

Signal Word

Danger

Hazard Statements

H272,H290,H314,H317,H411

Hazard Classifications

Aquatic Chronic 2 - Eye Dam. 1 - Met. Corr. 1 - Ox. Liq. 2 - Skin Corr. 1B - Skin Sens. 1

Supplementary Hazards

EUH071

Storage Class Code

5.1B - Oxidizing hazardous materials

WGK

WGK 3

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

Already Own This Product?

Find documentation for the products that you have recently purchased in the Document Library.

Visit the Document Library

Customers Also Viewed

Slide 1 of 1

1 of 1

Negative photoresist I

Sigma-Aldrich

651796

Negative photoresist I

Reconstituting Functional Microtubule-Barrier Interactions.
Methods in Cell Biology, 120(5), 69-90 (2014)
Fabrication and Mechanical Properties Measurements of 3D Microtissues for the Study of Cell-Matrix Interactions.
The Surfaceome, 120(5), 303-328 (2018)
The regeneration and recycle of chromium etching solutions using concentrator cell membrane technology.
Chaudhary AJ, et al.
Chemosphere, 62(5), 841-846 (2006)
Pressure-driven Fermi surface reconstruction of chromium
Stillwell RL, et al.
Physical Review, 88(12) (2013)
F J Alfaro-Mozaz et al.
Nature communications, 8, 15624-15624 (2017-06-08)
Polaritons in layered materials-including van der Waals materials-exhibit hyperbolic dispersion and strong field confinement, which makes them highly attractive for applications including optical nanofocusing, sensing and control of spontaneous emission. Here we report a near-field study of polaritonic Fabry-Perot resonances
View All Related Papers

Protocols

Negative Photoresist Procedure

Our photoresist kit was designed to have the necessary chemical components for each step in the lithographic process. The component materials are provided in pre-weighed quantities for your convenience. Etchants are available separately so that the proper etchant can be chosen for a variety of substrate choices.

Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.

Contact Technical Service