254371
Ethoxytrimethylsilane
98%
Synonym(s):
Trimethylethoxysilane
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About This Item
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Quality Level
Assay
98%
form
liquid
refractive index
n20/D 1.374 (lit.)
bp
75-76 °C (lit.)
density
0.757 g/mL at 25 °C (lit.)
SMILES string
CCO[Si](C)(C)C
InChI
1S/C5H14OSi/c1-5-6-7(2,3)4/h5H2,1-4H3
InChI key
RSIHJDGMBDPTIM-UHFFFAOYSA-N
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General description
Ethoxytrimethylsilane (ETMS) is an alkoxysilane that is used as a capping agent, which can tune the hydrophobic properties for a variety of substrates by coupling with the surface hydroxyl groups.
Sodium acetylacetonate reacts with dichloro trimethylsiloxyaluminium to form ethoxytrimethylsilane.{70} Ethoxytrimethylsilane reacts with alkali ions to form Si-O-M (M: alkali metal) linkage, which was investigated in detail by 29Si NMR.1
Application
ETMS can be used to modify the silica nanoparticles to form a hydrophobic coating with ultra-high molecular weight polyethylene on the surface of the steel. It may be used to methylate silica nanoparticles that form silica nano-capsules for stabilized oil-in water emulsions.
Signal Word
Danger
Hazard Statements
Precautionary Statements
Hazard Classifications
Flam. Liq. 2
Storage Class Code
3 - Flammable liquids
WGK
WGK 3
Flash Point(F)
-3.1 °F - closed cup
Flash Point(C)
-19.5 °C - closed cup
Personal Protective Equipment
dust mask type N95 (US), Eyeshields, Gloves
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Electron Moments and Structures of Organosilicon Compounds. III. The Oxygen-Silicon Bond1, 2.
Journal of the American Chemical Society, 75(12), 2824-2827 (1953)
Part I. Dichloro-and dibromotrimethylsiloxyaluminium: structure, and reaction with sodium acetylacetonate.
Journal of the Chemical Society, 603-605 (1966)
Surface chemistry and trimethylsilyl functionalization of Stober silica sols.
Journal of Non-Crystalline Solids, 316(2), 349-363 (2003)
Structural and photophysical properties of rare-earth complexes encapsulated into surface modified mesoporous silica nanoparticles.
Dalton Transactions, 43(43), 16183-16196 (2014)
Regiospecific synthesis of α-lithiated alkoxysilanes.
Journal of Organometallic Chemistry, 595(1), 87-92 (2000)
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