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495379

Sigma-Aldrich

Titanium(IV) oxysulfate solution

~15 wt. % in dilute sulfuric acid, 99.99% trace metals basis

Synonym(s):

Titanium oxide sulfate, Titanium oxysulfate, Titanyl sulfate (TiO(SO4 ))

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About This Item

Linear Formula:
TiOSO4
CAS Number:
Molecular Weight:
159.93
MDL number:
UNSPSC Code:
12352302
PubChem Substance ID:
NACRES:
NA.23

Assay

99.99% trace metals basis

form

liquid

reaction suitability

reagent type: catalyst
core: titanium

concentration

~15 wt. % in dilute sulfuric acid

impurities

≤150.0 ppm Trace Metal Analysis

bp

>100 °C

density

1.361 g/mL at 25 °C

SMILES string

O[Ti+3].O[Ti+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O

InChI

1S/3H2O4S.2H2O.2Ti/c3*1-5(2,3)4;;;;/h3*(H2,1,2,3,4);2*1H2;;/q;;;;;2*+4/p-8

InChI key

GEXADUANBMINSZ-UHFFFAOYSA-F

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Application

  • Characterization and properties of titanium (IV) oxide, synthesized by different routes: Discusses the use of titanium(IV) oxysulfate as a precursor in sol-gel methods to prepare titanium oxide solutions with varying pH values (Dontsova & Kutuzova, 2021).
  • Thermodynamic modeling of sulfate-acid and sulfate-fluoride leaching of titanium: Analyzes the production of titanium(IV) sulfate and oxysulfate as main products from rutile in sulfuric acid solutions (Dubenko et al., 2020).
  • Formation of TiO2 particles during thermal decomposition of Ti (NO3) 4, TiOF2 and TiOSO4: Investigates the thermal decomposition of titanium oxysulfide in acid solutions, forming TiO2 particles (Sofronov et al., 2020).

Pictograms

Corrosion

Signal Word

Danger

Hazard Statements

Hazard Classifications

Eye Dam. 1 - Met. Corr. 1 - Skin Corr. 1A

Storage Class Code

8A - Combustible corrosive hazardous materials

WGK

WGK 2

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

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Articles

In many technologies, performance requirements drive device dimensions below the scale of electron mean free paths (λe). This trend has increased scientific interest and technological importance of electrical resistivities at the nanoscale.

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