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Assay
99%
form
liquid
refractive index
n20/D 1.391 (lit.)
bp
56 °C (lit.)
density
0.681 g/mL at 25 °C (lit.)
SMILES string
CC[SiH2]CC
InChI
1S/C4H12Si/c1-3-5-4-2/h3-5H2,1-2H3
InChI key
UCXUKTLCVSGCNR-UHFFFAOYSA-N
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Application
Reagent employed in the chemical vapor deposition of SiO2 for microelectronics.
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Chemistry of Materials, 5, 1710-1710 (1993)
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