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Key Documents

1.12310

Supelco

Silicon standard solution

traceable to SRM from NIST acidic, (NH₄)₂SiF₆ in H₂O 1000 mg/l Si Certipur®

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About This Item

UNSPSC Code:
41116107

Agency

suitable for EPA 200.7

Quality Level

product line

Certipur®

technique(s)

ICP: suitable

pH

3.4 (20 °C in H2O)

density

1.00 g/cm3 at 20 °C

format

single component solution

storage temp.

15-25°C

Application


  • Particle size analysis for non-porous and mesoporous silica: Single-Particle Inductively Coupled Plasma Mass Spectrometry (SP-ICP-MS) is utilized to measure particle size and detect bound proteins on non-porous and mesoporous silica microspheres, highlighting its precision in assessing silicon-based carriers in biochemical applications (Miyashita et al., 2024).

  • Optimization of thermo-optic phase-shifters: The application of silicon standard solutions is crucial in optimizing double titanium nitride thermo-optic phase-shifter heaters using SOI technology, underscoring the importance of precise silicon calibration standards in semiconductor manufacturing (Krause and Malka, 2023).

Analysis Note

Concentration     β (Si): 990 - 1010 mg/l
Determination method: acidimetric titration.
(traceable to NIST - SRM 723e)
Accuracy of the method: ± 2 mg/l

Legal Information

CERTIPUR is a registered trademark of Merck KGaA, Darmstadt, Germany

Storage Class Code

12 - Non Combustible Liquids

WGK

WGK 2

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable


Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

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Articles

Efficiency of industrial plants and equipment constitutes one of the basic preconditions for sustainable economic operations. One avoidable problem is posed by the undesirable build-up of deposits, i.e., scale – in pipes, boilers, and turbines, whose principal cause is silicate. A rapid and sensitive test can ensure control over this threat.

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