Saltar al contenido
Merck
Todas las fotos(2)

Key Documents

View All Documentation

371904

Sigma-Aldrich

1,3-Divinyltetramethyldisiloxane

97%

Sinónimos:

1,1,3,3-Tetramethyl-1,3-divinyldisiloxane

Iniciar sesiónpara Ver la Fijación de precios por contrato y de la organización
Todas las fotos(2)

About This Item

Fórmula lineal:
[H2C=CHSi(CH3)2]2O
Número de CAS:
2627-95-4
Peso molecular:
186.40
Beilstein/REAXYS Number:
1762585
EC Number:
220-099-6
MDL number:
MFCD00014933
UNSPSC Code:
12162002
PubChem Substance ID:
24863134
NACRES:
NA.23

Quality Level

100

assay

97%

form

liquid

refractive index

n20/D 1.411 (lit.)

bp

139 °C (lit.)

mp

−99 °C (lit.)

density

0.809 g/mL at 25 °C (lit.)

SMILES string

C[Si](C)(O[Si](C)(C)C=C)C=C

InChI

1S/C8H18OSi2/c1-7-10(3,4)9-11(5,6)8-2/h7-8H,1-2H2,3-6H3

InChI key

BITPLIXHRASDQB-UHFFFAOYSA-N

Application


  • Synthesis and Studies on the Effect of Phenyl Side–Chain Content on Refractive Index of Polysiloxane Resin: This study used 1,3-divinyltetramethyldisiloxane as a terminating agent to modify polysiloxane resin properties (Ramli et al., 2015).

  • Undecenoic Acid-Based Polydimethylsiloxanes Obtained by Hydrosilylation and Hydrothiolation Reactions: This paper explored the use of 1,3-divinyltetramethyldisiloxane as a blocking agent in the synthesis of polydimethylsiloxanes (Milenin et al., 2020).

  • Efficient Improvement in Electrochemical Properties of High-Voltage Li-rich Mn-Based Layered Oxide Cathode by Addition of 1,3-divinyltetramethyldisiloxane: The additive 1,3-divinyltetramethyldisiloxane was used to enhance electrochemical properties of Li-rich layered oxide cathode (Huang et al., 2023).

pictograms

Flame
GHS02

signalword

Danger

hcodes

H225

Hazard Classifications

Flam. Liq. 2

Storage Class

3 - Flammable liquids

wgk_germany

WGK 3

flash_point_f

71.1 °F - closed cup

flash_point_c

21.7 °C - closed cup

ppe

Eyeshields, Faceshields, Gloves, type ABEK (EN14387) respirator filter

Elija entre una de las versiones más recientes:

Certificados de análisis (COA)

Lot/Batch Number
MKCP5367
MKCN7102
MKCM8508
MKCL9812
MKCJ9068

¿No ve la versión correcta?

Si necesita una versión concreta, puede buscar un certificado específico por el número de lote.

Busque por un COA

¿Ya tiene este producto?

Encuentre la documentación para los productos que ha comprado recientemente en la Biblioteca de documentos.

Visite la Librería de documentos

Seungmin Shin et al.
Nanotechnology, 27(47), 475301-475301 (2016-10-27)
Novel polyhedral oligomeric silsesquioxane (POSS) resists, which are based on a new photo-crosslinking system via Wolff rearrangement, are developed as ideal replica mold materials for ultraviolet-nanoimprint lithography. These POSS resist materials are synthesized by incorporating diazoketo and hydroxyl groups into
B Sivaranjini et al.
Scientific reports, 8(1), 8891-8891 (2018-06-13)
A simple and effective approach for vertical alignment of liquid crystals (LCs) over a functionalized transparent flexible substrate is described. Surface characterization of this commercially available plastic substrate through X-ray photoelectron spectroscopy (XPS) and attenuated total reflection infrared spectroscopy (ATR-IR)

Nuestro equipo de científicos tiene experiencia en todas las áreas de investigación: Ciencias de la vida, Ciencia de los materiales, Síntesis química, Cromatografía, Analítica y muchas otras.

Póngase en contacto con el Servicio técnico