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Tetrakis(dimethylamido)hafnium(IV)

packaged for use in deposition systems

• Synonym(s): TDMAH, Tetrakis(dimethylamino)hafnium(IV)
• Linear Formula: [(CH₃)₂N]₄Hf
• CAS Number: 19782-68-4
• Molecular Weight: 354.79
• MDL number: MFCD01862473
• UNSPSC Code: 12352300
• PubChem Substance ID: 24884811
• NACRES: NA.23

Properties

• Quality Level: 100
• Assay: ≥99.99% (trace metals analysis)
• form: low-melting solid
• reaction suitability: core: hafnium
• mp: 26-29 °C (lit.)
• density: 1.098 g/mL at 25 °C
• SMILES string: CN(C)[Hf](N(C)C)(N(C)C)N(C)C
• InChI: 1S/4C2H6N.Hf/c4*1-3-2;/h4*1-2H3;/q4*-1;+4
• InChI key: ZYLGGWPMIDHSEZ-UHFFFAOYSA-N

Description

General description

Alkyl amides of Hafnium provide a convenient and effective atomic layer deposition precursor to smooth and and amorphous hafnium oxide thin films.

Application

Precursors Packaged for Depositions Systems

Used as precursor for atomic layer deposition of Hafnium Oxide nanolaminates, which are used as a reploacement for Silicon oxide in semiconductor devices.

Safety Information

• Pictograms: GHS02,GHS05
• Signal Word: Danger
• Hazard Statements: H228 - H261 - H314
• Precautionary Statements: P210 - P231 + P232 - P280 - P305 + P351 + P338 - P370 + P378 - P402 + P404
• Hazard Classifications: Flam. Sol. 1 - Skin Corr. 1B - Water-react 2
• Supplementary Hazards: EUH014
• Storage Class Code: 4.3 - Hazardous materials, which set free flammable gases upon contact with water
• WGK: WGK 3
• Flash Point(F): 109.4 °F - closed cup
• Flash Point(C): 43 °C - closed cup
• Personal Protective Equipment: dust mask type N95 (US), Eyeshields, Gloves