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N7524

Sigma-Aldrich

Bis(cyclopentadienyl)nickel(II)

Synonym(s):

Di(cyclopentadienyl)nickel(II), Nickelocene

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About This Item

Linear Formula:
Ni(C5H5)2
CAS Number:
Molecular Weight:
188.88
EC Number:
MDL number:
UNSPSC Code:
12352103
PubChem Substance ID:
NACRES:
NA.23

form

solid

composition

Ni, 20.0-31.5% EDTA titration

reaction suitability

core: nickel
reagent type: catalyst

mp

171-173 °C (lit.)

SMILES string

[Ni].[CH]1[CH][CH][CH][CH]1.[CH]2[CH][CH][CH][CH]2

InChI

1S/2C5H5.Ni/c2*1-2-4-5-3-1;/h2*1-5H;

InChI key

FOOKRXHSBKEWSE-UHFFFAOYSA-N

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Application

This metal alkyl may be used to synthesize hybrid organic-inorganic polymeric molecular layer deposition (MLD). Bis(cyclopentadienyl) nickel (Cp 2 Ni) may be used as a Ni precursor for the atomic layer deposition (ALD) of NiO/carbon nanotubes hybrids.

Signal Word

Danger

Hazard Statements

Hazard Classifications

Acute Tox. 4 Oral - Carc. 1A - Flam. Sol. 1 - Skin Sens. 1

Storage Class Code

4.1B - Flammable solid hazardous materials

WGK

WGK 3

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

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Enhanced Catalytic Activity for Methanol Electro-oxidation of Uniformly Dispersed Nickel Oxide Nanoparticles?Carbon Nanotube Hybrid Materials.
Tong X, et al.
Small, 8(22), 3390-3395 (2012)
Molecular Layer Deposition of Organic and Hybrid Organic-Inorganic Polymers.
George SM and Yoon B
Material Matters, 3(2), 34-37 null
Patrick P Komane et al.
International journal of molecular sciences, 21(7) (2020-03-29)
Currently, there is a lack of ultrasensitive diagnostic tool to detect some diseases such as ischemic stroke, thereby impacting effective and efficient intervention for such diseases at an embryonic stage. In addition to the lack of proper detection of the

Articles

Atomic layer deposition (ALD) techniques have emerged in the last ten years to meet various needs including semiconductor device miniaturization, conformal deposition on porous structures and coating of nanoparticles. ALD is based on two sequential self-limiting surface reactions.

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