추천 제품
Quality Level
분석
≥95% trace metals basis
양식
nanopowder
spherical
표면적
278-335 m2/g , BET
입자 크기
<10 nm (TEM)
density
3.5 g/mL at 25 °C (lit.)
벌크 밀도
0.17 g/mL
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일반 설명
Diamond nanopowder (DNPs) may be produced by multicathode direct current plasma chemical vapor deposition and high pressure high temperature (HPHT).
Potential uses of nano-diamond are in biosensor applications. Surface modification of nano-diamond may enhance its linking mechanism with specific biomolecules. DNPs can be subjected to functionalization post Fenton treatment. These functionalized DNPs may be used as gene delivery systems.
Potential uses of nano-diamond are in biosensor applications. Surface modification of nano-diamond may enhance its linking mechanism with specific biomolecules. DNPs can be subjected to functionalization post Fenton treatment. These functionalized DNPs may be used as gene delivery systems.
Storage Class Code
11 - Combustible Solids
WGK
nwg
Flash Point (°F)
Not applicable
Flash Point (°C)
Not applicable
개인 보호 장비
Eyeshields, Gloves, type N95 (US)
Nano-jewels in biology. Gold and platinum on diamond nanoparticles as antioxidant systems against cellular oxidative stress.
Marti?n R, et al.
ACS Nano, 4(11), 6957-6965 (2010)
Reactions of amines with CVD diamond nanopowders.
Lee J K, et al.
Diamond and Related Materials, 14(3-7), 675-678 (2005)
Functionalized diamond nanopowder for phosphopeptides enrichment from complex biological fluids.
Hussain D, et al.
Analytica Chimica Acta, 775, 75-84 (2013)
Elżbieta Czarniewska et al.
Scientific reports, 9(1), 10330-10330 (2019-07-19)
This article shows that nanodiamonds can transmigrate through the insect cuticle easily, and the doses used were not hemocytotoxic and did not cause inhibition of cellular and humoral immune responses in larvae, pupae and adults of Tenebrio molitor. The examination
Pontus Forsberg et al.
Optics express, 21(3), 2693-2700 (2013-03-14)
Control of the sidewall angle of diamond microstructures was achieved by varying the gas mixture, bias power and mask shape during inductively coupled plasma etching. Different etch mechanisms were responsible for the angle of the lower and upper part of
Global Trade Item Number
| SKU | GTIN |
|---|---|
| 636444-1G | 4061832722719 |
| 636444-5G | 4061832722726 |
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