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767506

Sigma-Aldrich

Titanium

sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.995% trace metals basis

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About This Item

Empirical Formula (Hill Notation):
Ti
CAS Number:
7440-32-6
Molecular Weight:
47.87
EC Number:
231-142-3
MDL number:
MFCD00011264
UNSPSC Code:
12352103
PubChem Substance ID:
329767320
NACRES:
NA.23

Quality Level

100

Assay

99.995% trace metals basis

form

solid

autoignition temp.

860 °F

reaction suitability

core: titanium

resistivity

42.0 μΩ-cm, 20°C

diam. × thickness

2.00 in. × 0.25 in.

bp

3287 °C (lit.)

mp

1660 °C (lit.)

density

4.5 g/mL at 25 °C (lit.)

SMILES string

[Ti]

InChI

1S/Ti

InChI key

RTAQQCXQSZGOHL-UHFFFAOYSA-N

Application

Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. The extreme miniaturization of components in the semiconductor and electronics industry requires high purity sputtering targets for thin film deposition.

Storage Class Code

11 - Combustible Solids

WGK

nwg

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

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Kostantinidis, S.; et al.
The European Physical Journal - Applied Physics, 56, 24002/1-24002/1 (2011)
Helmersson; U.; et al.
Thin Solid Films, 513, 1-1 (2006)
A Kurbad et al.
International journal of computerized dentistry, 16(2), 125-141 (2013-08-13)
This article presents two novel options for lithium-disilicate restorations supported by single-tooth implants. By using a Ti-Base connector, hybrid abutments and hybrid abutment crowns can be fabricated for different implant systems. The latter option in particular is an interesting new
J H Kim et al.
Journal of nanoscience and nanotechnology, 13(7), 4601-4607 (2013-08-02)
Nanocytalline TiN films were deposited on non-alkali glass and Al substrates by reactive DC magnetron sputtering (DCMS) with an electromagnetic field system (EMF). The microstructure and corrosion resistance of the TiN-coated Al substrates were estimated by X-ray diffraction (XRD), scanning
Jinho Shin et al.
Journal of nanoscience and nanotechnology, 13(8), 5807-5810 (2013-07-26)
In this study, hydroxyapatite (HA) was coated on anodized titanium (Ti) surfaces through radio frequency magnetron sputtering in order to improve biological response of the titanium surface. All the samples were blasted with resorbable blasting media (RBM). RBM-blasted Ti surface
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