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Key Documents

667447

Sigma-Aldrich

Ceramic Etchant A

Synonym(s):

Al2O3 Etch, Aluminum Oxide Etchant, GaN Etch, Gallium Nitride Etchant, Si3N4 Etch, Silicon Nitride Etchant

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About This Item

MDL number:
MFCD08705343
UNSPSC Code:
12352300
NACRES:
NA.23

Application

Useful for fast and controllable etching of silicon nitride (Si3N4), galium nitride (GaN), or aluminum oxide (Al2O3).

Features and Benefits

Etch Rates @ 180 °C:
Aluminum oxide 120 Å/min
Silicon nitride 125 Å/min
Gallium nitride 80 Å/min
Silicon dioxide 1 Å/min
Silicon 1 Å/min

Pictograms

CorrosionExclamation mark
GHS05,GHS07

Signal Word

Danger

Hazard Statements

H290,H302,H314

Hazard Classifications

Acute Tox. 4 Oral - Eye Dam. 1 - Met. Corr. 1 - Skin Corr. 1B

Storage Class Code

8B - Non-combustible corrosive hazardous materials

WGK

WGK 1

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

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Certificates of Analysis (COA)

Lot/Batch Number
MKCP2744
MKCP1720
MKCN8999
MKCN8621
MKCH5912

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